Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL5359924

CC(C)Oc1ccc([S+]2CCCC2)c2ccccc12.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.36

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Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.36
MAPT P10636 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
HTR2A P28223 1/20 0.32
TSPO P30536 1/20 0.32
GPR183 P32249 1/20 0.32
APLNR P35414 1/20 0.32
RXFP1 Q9HBX9 1/20 0.32
GPR3 P46089 1/20 0.31
DRD2 P14416 1/20 0.30
ADRA1D P25100 1/20 0.30
ADRA1A P35348 1/20 0.30
ADRA1B P35368 1/20 0.30
KEAP1 Q14145 1/20 0.30
NFE2L2 Q16236 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL648394 0.91 GPR3 (0.30) GPR3
Trifluoromethanesulfonic Acid SCHEMBL31168251 0.91 GPR3 (0.30) GPR3
SCHEMBL5353994 0.89 CYP1A2 (0.32) CYP1A2MAPTCYP2C9CYP2C19
SCHEMBL5354552 0.88 CYP1A2 (0.32) CYP1A2MAPTCYP2C9CYP2C19
Trifluoromethanesulfonic Acid SCHEMBL5972628 0.87 HTT (0.31)
Trifluoromethanesulfonic Acid SCHEMBL36502 0.86 ALDH1A1 (0.37) GPR3KEAP1NFE2L2
Trifluoromethanesulfonic Acid SCHEMBL31168290 0.86 ALDH1A1 (0.37) GPR3KEAP1NFE2L2
SCHEMBL5972940 0.86 CYP1A2 (0.39) CYP1A2MAPTCYP2C9CYP2C19
Trifluoromethanesulfonic Acid SCHEMBL647770 0.85 MMP2 (0.31) MAPT
Trifluoromethanesulfonic Acid SCHEMBL5357147 0.84 GPR3 (0.32) GPR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
EP-1085379-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-01-04 EP disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6482568-B1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-19 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed