Hydrogen Peroxide

Hydrogen Peroxide

SCHEMBL5367632

CCOC(=O)C(C)O.OO

nearest known ligand 0.48

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Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
LMNA P02545 1/20 0.46
HSD17B10 Q99714 1/20 0.46
TP53 P04637 1/20 0.45
ALOX15 P16050 1/20 0.43
MGAM O43451 1/20 0.43
GAA P10253 1/20 0.43
SI P14410 1/20 0.43
MGAM2 Q2M2H8 1/20 0.43
SOAT1 P35610 1/20 0.43
HCAR2 Q8TDS4 1/20 0.41
PIN1 Q13526 1/20 0.41
TRPA1 O75762 1/20 0.40
MEN1 O00255 1/20 0.39
NPC1 O15118 1/20 0.39
KMT2A Q03164 1/20 0.39
MMP8 P22894 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL28391088 0.97 ALDH1A1 (0.46) ALDH1A1LMNAHSD17B10TP53ALOX15
SCHEMBL29615225 0.97
SCHEMBL471892 0.97 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10TP53ALOX15
SCHEMBL22598 0.97
SCHEMBL344175 0.97
SCHEMBL284806 0.97
Acetic Acid SCHEMBL4138880 0.95 ALDH1A1 (0.48) ALDH1A1LMNAHSD17B10TP53ALOX15
Benzene SCHEMBL3176015 0.95 PIN1 (0.47) ALDH1A1LMNAHSD17B10TP53ALOX15
Acetic Acid SCHEMBL1660055 0.95 ALDH1A1 (0.48) ALDH1A1LMNAHSD17B10TP53ALOX15
Lactic Acid SCHEMBL370698 0.95 TP53 (0.55) ALDH1A1LMNAHSD17B10TP53ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7250374-B2 System and method for processing a substrate using supercritical carbon dioxide processing TOKYO ELECTRON LIMITED (JP) 2007-07-31 US claimed
WO-2006007005-A1 A SYSTEM AND METHOD FOR PROCESSING A SUBSTRATE USING SUPERCRITICAL CARBON DIOXIDE PROCESSING TOKYO ELECTRON LIMITED (JP) 2006-01-19 WO claimed
US-20060003592-A1 System and method for processing a substrate using supercritical carbon dioxide processing TOKYO ELECTRON LIMITED 2006-01-05 US claimed