Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | VDR | P11473 | 3/20 | 0.74 |
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.71 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.71 |
| ▸ | MAPT | P10636 | 9/20 | 0.71 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.71 |
| ▸ | HPGD | P15428 | 7/20 | 0.71 |
| ▸ | MEN1 | O00255 | 5/20 | 0.69 |
| ▸ | F2 | P00734 | 4/20 | 0.67 |
| ▸ | HTT | P42858 | 4/20 | 0.56 |
| ▸ | LMNA | P02545 | 3/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.52 |
| ▸ | XBP1 | P17861 | 2/20 | 0.52 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.52 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.52 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.52 |
| ▸ | THRB | P10828 | 1/20 | 0.52 |
| ▸ | RECQL | P46063 | 1/20 | 0.51 |
| ▸ | CASP3 | P42574 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5557977 | 0.88 | KMT2A (0.58) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL3844039 | 0.85 | VDR (0.55) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL64277 | 0.85 | VDR (1.00) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL29370293 | 0.85 | VDR (1.00) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL5551949 | 0.84 | VDR (0.65) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL5551953 | 0.84 | VDR (0.55) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL64368 | 0.83 | KDM4E (1.00) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL14620101 | 0.82 | VDR (0.67) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL2468373 | 0.82 | KMT2A (1.00) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL8778106 | 0.81 | KDM4E (0.76) | VDRKDM4EALDH1A1MAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240302743-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-09-12 | — | — | US | disclosed |
| US-11760865-B2 | Halogen-free sulphonic acid ester and/or sulphinic acid ester as flame retardant, flame retardant synergists and radical generators in plastics | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) | 2023-09-19 | — | — | US | disclosed |
| US-11760865-B2 | Halogen-free sulphonic acid ester and/or sulphinic acid ester as flame retardant, flame retardant synergists and radical generators in plastics | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) | 2023-09-19 | — | — | US | disclosed |
| CN-112987497-A | Resist composition and resist pattern forming method | 东京应化工业株式会社 | 2021-06-18 | — | — | CN | disclosed |
| US-20200231783-A1 | HALOGEN-FREE SULPHONIC ACID ESTER AND/OR SULPHINIC ACID ESTER AS FLAME RETARDANT, FLAME RETARDANT SYNERGISTS AND RADICAL GENERATORS IN PLASTICS | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. (DE) | 2020-07-23 | — | — | US | disclosed |
| EP-2278399-B1 | Positive-working resist composition | FUJIFILM CORP (JP) | 2013-05-15 | — | — | EP | disclosed |
| EP-1341038-B1 | Photosensitive resin composition | FUJIFILM CORP (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| EP-1179750-B1 | Positive photosensitive composition and method for producing a precision integrated circuit element using the same | FUJIFILM CORP (JP) | 2012-07-25 | — | — | EP | disclosed |
| EP-0848289-B1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2002-02-27 | — | — | EP | disclosed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6042988-A | ALKALI-SOLUBLE RESIN, A COMPOUND CAPABLE OF GENERATING AN ACID BY IRRADIATION AND A CROSSLINKING AGENT, AND FURTHER CONTAINS AN ORGANIC CARBOXYLIC ACID AS ACIDIC COMPOUND AND ORGANIC AMINE AS ALKALINE COMPOUND; DEFINITION AND PRECISION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-03-28 | — | — | US | disclosed |
| US-5928837-A | Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | disclosed |
| EP-0848289-A1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-17 | — | — | EP | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |
| EP-0058638-B1 | CURABLE COMPOSITIONS CONTAINING AN ACID-CURABLE RESIN, AND PROCESS FOR CURING THEM | CIBA-GEIGY AG (CH) | 1985-08-28 | — | — | EP | disclosed |
| EP-0058638-A2 | Curable compositions containing an acid-curable resin, and process for curing them | CIBA-GEIGY AG (CH) | 1982-08-25 | — | — | EP | disclosed |