Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | VDR | P11473 | 3/20 | 1.00 |
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.78 |
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.78 |
| ▸ | HPGD | P15428 | 7/20 | 0.78 |
| ▸ | MAPT | P10636 | 9/20 | 0.77 |
| ▸ | KMT2A | Q03164 | 9/20 | 0.77 |
| ▸ | MEN1 | O00255 | 6/20 | 0.76 |
| ▸ | F2 | P00734 | 4/20 | 0.72 |
| ▸ | HTT | P42858 | 3/20 | 0.66 |
| ▸ | XBP1 | P17861 | 2/20 | 0.66 |
| ▸ | LMNA | P02545 | 2/20 | 0.60 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.60 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.60 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.60 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.60 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.60 |
| ▸ | THRB | P10828 | 1/20 | 0.56 |
| ▸ | PARL | Q9H300 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29370293 | 1.00 | VDR (1.00) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL5566879 | 0.92 | VDR (0.85) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL462047 | 0.88 | ALDH1A1 (1.00) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL64368 | 0.87 | KDM4E (1.00) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL5556208 | 0.87 | VDR (0.77) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL14099607 | 0.87 | VDR (0.76) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL2468373 | 0.86 | KMT2A (1.00) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL27718683 | 0.86 | VDR (0.75) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL5369841 | 0.85 | VDR (0.74) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL8778106 | 0.85 | KDM4E (0.76) | VDRKDM4EALDH1A1HPGDMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1449 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119978604-A | Polymer film composition, polymer film, and laminate | 福斯特(滁州)新材料有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-119364669-B | Substrate material surface gold plating treatment process in EBGA process | 深圳市芯海微电子有限公司 | 2025-03-25 | — | — | CN | claimed |
| CN-119528957-A | Zirconium metal oxide nanocluster photoresist material modified by fluorine-containing aromatic acid ligand, and preparation method and application thereof | 山东大学 | 2025-02-28 | — | — | CN | claimed |
| CN-119414657-A | Fluorine-containing titanium oxide nanoparticle photoresist material, preparation method thereof and application thereof in photoetching technology | 山东大学 | 2025-02-11 | — | — | CN | claimed |
| CN-119364669-A | Substrate material surface gold plating treatment process in EBGA process | 深圳市芯海微电子有限公司 | 2025-01-24 | — | — | CN | claimed |
| CN-118909215-A | Photo-acid-production catalyzed polyimide microsphere and preparation method thereof | 山东大学 | 2024-11-08 | — | — | CN | claimed |
| CN-118732392-A | Photoresist composition and preparation method thereof | 万华化学集团股份有限公司 | 2024-10-01 | — | — | CN | claimed |
| CN-113744927-B | Photo-welding method for metal nanowire, metal transparent conductive electrode and metal nanowire ink | 暨南大学 | 2024-06-28 | — | — | CN | claimed |
| CN-117518718-A | Photoresist composition and preparation method of driving substrate | TCL华星光电技术有限公司 | 2024-02-06 | — | — | CN | claimed |
| CN-111880371-B | Photoresist and method for patterning imine material | 常州华睿芯材科技有限公司 | 2022-05-03 | — | — | CN | claimed |
| EP-2507307-A2 | USE OF PROTECTED N-HYDROXYIMIDE DERIVATES AND TRANSITION METAL AS OXYGEN SCAVENGER SYSTEM IN TRANSPARENT POLYOLEFIN FILMS | BASF SE (DE) | 2012-10-10 | — | — | EP | claimed |
| WO-2011067197-A2 | USE OF PROTECTED N-HYDROXYIMIDE DERIVATES AND TRANSITION METAL AS OXYGEN SCAVENGER SYSTEM IN TRANSPARENT POLYOLEFIN FILMS | BASF SE (DE) | 2011-06-09 | — | — | WO | claimed |
| CN-101738856-A | Sensible heat composition for positive thermosensitive CTP plate without preheating and plate-making method by using same | GUANGXI YULIN JINLONG PS PLATE | 2010-06-16 | — | — | CN | claimed |
| US-20040253547-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-16 | — | — | US | claimed |
| US-6274286-B1 | Resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-14 | — | — | US | claimed |
| US-6171755-B1 | Chemically amplified resist | INFINEON TECHNOLOGIES AG (DE) | 2001-01-09 | — | — | US | claimed |
| US-6083697-A | Chemical amplification for the synthesis of patterned arrays | AFFYMETRIX, INC. (US) | 2000-07-04 | — | — | US | claimed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| EP-0465064-B1 | Process for forming patterns | FUJITSU LTD (JP) | 1998-12-09 | — | — | EP | claimed |
| EP-0465064-A2 | Resist and process for forming patterns using the same | FUJITSU LIMITED (JP) | 1992-01-08 | — | — | EP | claimed |