Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | VDR | P11473 | 3/20 | 1.00 |
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.78 |
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.78 |
| ▸ | HPGD | P15428 | 7/20 | 0.78 |
| ▸ | MAPT | P10636 | 9/20 | 0.77 |
| ▸ | KMT2A | Q03164 | 9/20 | 0.77 |
| ▸ | MEN1 | O00255 | 6/20 | 0.76 |
| ▸ | F2 | P00734 | 4/20 | 0.72 |
| ▸ | HTT | P42858 | 3/20 | 0.66 |
| ▸ | XBP1 | P17861 | 2/20 | 0.66 |
| ▸ | LMNA | P02545 | 2/20 | 0.60 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.60 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.60 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.60 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.60 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.60 |
| ▸ | THRB | P10828 | 1/20 | 0.56 |
| ▸ | PARL | Q9H300 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL64277 | 1.00 | VDR (1.00) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL5566879 | 0.92 | VDR (0.85) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL462047 | 0.88 | ALDH1A1 (1.00) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL64368 | 0.87 | KDM4E (1.00) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL5556208 | 0.87 | VDR (0.77) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL14099607 | 0.87 | VDR (0.76) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL2468373 | 0.86 | KMT2A (1.00) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL27718683 | 0.86 | VDR (0.75) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL5369841 | 0.85 | VDR (0.74) | VDRKDM4EALDH1A1HPGDMAPT | |
| SCHEMBL8778106 | 0.85 | KDM4E (0.76) | VDRKDM4EALDH1A1HPGDMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| US-20250068070-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATIVE FILM, SURFACE-PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-02-27 | — | — | US | disclosed |
| CN-111198480-B | Photosensitive resin composition, pattern forming method and antireflection film | 信越化学工业株式会社 | 2025-02-11 | — | — | CN | disclosed |
| EP-4502729-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATIVE FILM, SURFACE-PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-02-05 | — | — | EP | disclosed |
| US-12203019-B2 | Nanoparticle having dissociable protective group, nanoparticle layer patterning method and related application | Beijing Boe Technology Development Co., Ltd. (CN) | 2025-01-21 | — | — | US | disclosed |
| CN-114341215-B | Curable composition | 株式会社日本触媒 | 2024-12-27 | — | — | CN | disclosed |
| CN-119179233-A | Photosensitive composition, method for producing pattern, cured product, and electronic component | 江苏艾森半导体材料股份有限公司 | 2024-12-24 | — | — | CN | disclosed |
| CN-112534353-B | Photosensitive resin composition, method for forming resist pattern, method for producing plated molded article, and semiconductor device | JSR株式会社 | 2024-12-24 | — | — | CN | disclosed |
| CN-109976091-B | Photosensitive resin composition, pattern forming method, and manufacture of optoelectronic semiconductor device | 信越化学工业株式会社 | 2024-09-27 | — | — | CN | disclosed |
| US-20240182783-A1 | QUANTUM DOTS MATERIAL SOLUTION, METHOD OF FORMING QUANTUM DOTS LAYER, AND ARRAY SUBSTRATE, DISPLAY PANEL, AND METHOD OF FABRICATING DISPLAY PANEL | Beijing Boe Technology Development Co., Ltd. (CN) | 2024-06-06 | — | — | US | disclosed |
| CN-114975098-A | Nanoimprint liquid material, method for producing pattern of cured product, and method for producing circuit board | 佳能株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-108732831-B | Resin composition, substrate and element comprising same, and method for producing same | JSR株式会社 | 2022-08-16 | — | — | CN | disclosed |
| CN-114746809-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method, and light-emitting element | 信越化学工业株式会社 | 2022-07-12 | — | — | CN | disclosed |
| CN-107251193-B | Nanoimprint liquid material, method for producing pattern of cured product, method for producing optical component, and method for producing circuit board | 佳能株式会社 | 2022-06-21 | — | — | CN | disclosed |
| US-20220169922-A1 | NANOPARTICLE, NANOPARTICLE LAYER PATTERNING METHOD AND RELATED APPLICATION | Beijing Boe Technology Development Co., Ltd. | 2022-06-02 | — | — | US | disclosed |
| CN-114460809-A | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-05-10 | — | — | CN | disclosed |
| CN-109422881-B | Epoxy group-containing isocyanurate-modified silicone resin, photosensitive resin composition, photosensitive dry film, laminate, and pattern formation method | 信越化学工业株式会社 | 2022-04-19 | — | — | CN | disclosed |
| CN-114341215-A | Curable composition | 株式会社日本触媒 | 2022-04-12 | — | — | CN | disclosed |
| CN-108885399-B | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-03-15 | — | — | CN | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |