⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL49131 | 1.00 | — | — | |
| SCHEMBL2978721 | 1.00 | — | — | |
| SCHEMBL952911 | 1.00 | — | — | |
| SCHEMBL6734791 | 1.00 | — | — | |
| SCHEMBL4881454 | 0.82 | — | — | |
| Potassium SCHEMBL2450054 | 0.82 | — | — | |
| SCHEMBL717964 | 0.82 | — | — | |
| SCHEMBL716950 | 0.82 | — | — | |
| SCHEMBL895890 | 0.82 | — | — | |
| SCHEMBL10890316 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 328 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119735440-B | Preparation method of superfine boron carbide spray granulation powder | 苏州化联高新陶瓷材料有限公司 | 2025-06-24 | — | — | CN | claimed |
| CN-119735440-A | Preparation method of superfine boron carbide spray granulation powder | 苏州化联高新陶瓷材料有限公司 | 2025-04-01 | — | — | CN | claimed |
| CN-116719193-A | InP-based Mach-Zehnder interference type electro-optic modulator and preparation method thereof | 中国电子科技集团公司第四十四研究所 | 2023-09-08 | — | — | CN | claimed |
| CN-116284142-A | Cyclotriphosphazene containing nitrogen silane side group and preparation method and application thereof | 国联汽车动力电池研究院有限责任公司 | 2023-06-23 | — | — | CN | claimed |
| CN-113754441-B | Photosensitive resin and preparation method and application thereof | 山东理工大学 | 2023-02-17 | — | — | CN | claimed |
| CN-115180954-A | Preparation method of carbon-based composite material brake pad | 西安航空制动科技有限公司 | 2022-10-14 | — | — | CN | claimed |
| CN-113735597-B | Preparation method of polymer conversion ceramic-based wave-absorbing material loaded with nitrogen-doped graphene in situ | 西北工业大学 | 2022-07-05 | — | — | CN | claimed |
| CN-114497296-A | Hydrophobic LED chip and preparation method thereof | 江西兆驰半导体有限公司 | 2022-05-13 | — | — | CN | claimed |
| CN-114263048-A | Organosilicon synthetic leather surface course, preparation method and organosilicon synthetic leather | 杭州崇耀科技发展有限公司 | 2022-04-01 | — | — | CN | claimed |
| CN-111646480-B | Crystalline nano silicon dioxide and preparation method thereof | 河南大学 | 2021-12-28 | — | — | CN | claimed |
| CN-102437372-A | Lithium ion battery electrolyte and lithium ion battery containing same | HUAWEI TECH CO LTD | 2012-05-02 | — | — | CN | claimed |
| CN-101389307-A | Kit comprising a silicone oil and silicone compounds X or Y capable of reacting together on the eyelashes | OREAL (FR) | 2009-03-18 | — | — | CN | claimed |
| CN-1276804-C | Improvements in drying and cleaning objects using controlled aerosols and gases | FERRELL GARY W (US) | 2006-09-27 | — | — | CN | claimed |
| CN-1261509-C | Porous siliceous film having low permittivity, semiconductor devices and coating composition | AZ ELECTRONIC MATERIAL JAPAN C (JP) | 2006-06-28 | — | — | CN | claimed |
| CN-1449576-A | Porous siliceous film having low dielectric constant, semiconductor device and coating composition | CLARIANT INT LTD (CH) | 2003-10-15 | — | — | CN | claimed |
| CN-1398206-A | Improvements in drying and cleaning objects using controlled aerosols and gases | FERRELL GARY W (US) | 2003-02-19 | — | — | CN | claimed |
| CN-1268099-A | Method for fabricating silicon oxynitride | CORNING INC (US) | 2000-09-27 | — | — | CN | claimed |
| CN-1012603-B | Make the method for solar cell with silicon nitride coating | MOBIL SOLAR ENERGY CORP (US) | 1991-05-08 | — | — | CN | claimed |
| CN-1005880-B | Method for depositing vertical resistor | 英特尔公司 | 1989-11-22 | — | — | CN | claimed |
| CN-86107982-A | Deposit the method for vertical direction resistance with the chemical vapour deposition technique of plasma enhancing | — | 1987-08-12 | — | — | CN | claimed |