⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4396869 | 0.86 | SOAT1 (0.37) | — | |
| SCHEMBL5482205 | 0.81 | SOAT1 (0.43) | — | |
| SCHEMBL3908581 | 0.74 | TSHR (0.31) | — | |
| SCHEMBL6914208 | 0.73 | — | — | |
| SCHEMBL445043 | 0.73 | — | — | |
| SCHEMBL2026715 | 0.71 | LMNA (0.44) | — | |
| SCHEMBL4997659 | 0.71 | — | — | |
| SCHEMBL14759998 | 0.71 | — | — | |
| SCHEMBL3075248 | 0.71 | — | — | |
| SCHEMBL3463747 | 0.70 | TSHR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11965111-B2 | Surface treatment agent and surface treatment method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-04-23 | — | — | US | disclosed |
| CN-113474352-A | Novel phosphoramidites | 罗氏创新中心哥本哈根有限公司 | 2021-10-01 | — | — | CN | disclosed |
| US-10941301-B2 | Surface treatment method, surface treatment agent, and method for forming film region-selectively on substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-03-09 | — | — | US | disclosed |
| US-20200079962-A1 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-03-12 | — | — | US | disclosed |
| US-20200062968-A1 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-02-27 | — | — | US | disclosed |
| US-20190203054-A1 | SURFACE TREATMENT METHOD, SURFACE TREATMENT AGENT, AND METHOD FOR FORMING FILM REGION-SELECTIVELY ON SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-04 | — | — | US | disclosed |
| US-20070129331-A1 | PHARMACEUTICAL COMPOSITIONS AND METHODS OF USE OF LIPOPHILIC, SILICON-SUBSTITUTED, CYCLOOXYGENASE-2 SELECTIVE NON-STEROIDAL ANTI-INFLAMMATORY DRUGS AND DERIVATIVES | RND PHARMACEUTICALS, INC. (US) | 2007-06-07 | — | — | US | disclosed |
| CN-1747995-A | Resin compositions | CIBA SC HOLDING AG (CH) | 2006-03-15 | — | — | CN | disclosed |