SCHEMBL5375649

SCHEMBL5375649

O=[N+]([O-])c1ccc2c3c(cccc13)C=C2

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.57
ALDH1A1 P00352 5/20 0.56
CYP3A4 P08684 2/20 0.56
ALOX15 P16050 1/20 0.56
HSD17B10 Q99714 1/20 0.56
NPC1 O15118 4/20 0.49
KMT2A Q03164 4/20 0.49
MEN1 O00255 3/20 0.49
RAB9A P51151 3/20 0.49
GAA P10253 2/20 0.49
CTSB P07858 3/20 0.47
POLB P06746 3/20 0.43
NPSR1 Q6W5P4 2/20 0.41
S1PR4 O95977 1/20 0.41
HPGD P15428 1/20 0.41
XBP1 P17861 1/20 0.41
S1PR1 P21453 1/20 0.41
CCR6 P51684 1/20 0.41
GPR35 Q9HC97 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10526689 0.79 TDP1 (0.74) TDP1ALDH1A1CYP3A4ALOX15HSD17B10
SCHEMBL7912372 0.79 TDP1 (0.67) TDP1ALDH1A1CYP3A4ALOX15HSD17B10
SCHEMBL6154766 0.78 AKR1C4 (0.44) TDP1ALDH1A1CYP3A4ALOX15HSD17B10
SCHEMBL9115242 0.76 CTSB (0.40) TDP1ALDH1A1CYP3A4ALOX15HSD17B10
Ammonia Solution, Strong SCHEMBL6416651 0.74 MEN1 (0.68) TDP1ALDH1A1CYP3A4ALOX15HSD17B10
SCHEMBL30879591 0.74 ALDH1A1 (0.49) TDP1ALDH1A1CYP3A4ALOX15HSD17B10
SCHEMBL7788656 0.74 TDP1 (0.80) TDP1ALDH1A1CYP3A4ALOX15HSD17B10
SCHEMBL29475175 0.74 TDP1 (1.00) TDP1ALDH1A1CYP3A4ALOX15HSD17B10
SCHEMBL57166 0.74 TDP1 (1.00) TDP1ALDH1A1CYP3A4ALOX15HSD17B10
SCHEMBL9484180 0.74 TDP1 (0.52) TDP1ALDH1A1HSD17B10KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112680498-A High-throughput screening method for genotoxic substances 华南理工大学 2021-04-20 CN claimed
CN-119948073-A Resin, composition, photocrosslinked product, pattern and electronic device provided with same 东曹株式会社 2025-05-06 CN disclosed
CN-113917078-B Method for predicting bioavailability of nitropolycyclic aromatic hydrocarbon in sediment based on zeolite imidazole ester skeleton structure material and hexagonal boron nitride 南京师范大学 2024-05-28 CN disclosed
CN-111465593-B Novel compound, photopolymerization initiator containing the same, and photosensitive resin composition containing the photopolymerization initiator 日本化药株式会社 2023-06-23 CN disclosed
CN-107429082-B Composition for forming cured film, alignment material, and phase difference material 日产化学工业株式会社 2023-02-03 CN disclosed
CN-115558337-A Luminescent nanoparticle ink, luminescent nanoparticle color film prepared from luminescent nanoparticle ink and display device 苏州星烁纳米科技有限公司 2023-01-03 CN disclosed
CN-114901468-A Laminate, method for producing same, and automotive exterior material 三菱化学株式会社 2022-08-12 CN disclosed
CN-108700779-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学工业株式会社 2022-06-10 CN disclosed
CN-114616518-A Method for manufacturing patterned single-layer phase difference material 日产化学株式会社 2022-06-10 CN disclosed
CN-114540032-A Quantum dot composition for photoluminescence, quantum dot photoluminescent film prepared from same and display device 苏州星烁纳米科技有限公司 2022-05-27 CN disclosed
EP-1205805-A1 Anti-reflection coating forming composition JSR Corporation (JP) 2002-05-15 EP disclosed
EP-0616701-B1 PHOTOCURABLE CYCLOBUTARENE COMPOSITIONS DOW CHEMICAL CO (US) 2002-02-13 EP disclosed
EP-0616701-A4 PHOTOCURABLE CYCLOBUTARENE COMPOSITIONS. DOW CHEMICAL CO (US) 1995-06-14 EP disclosed
EP-0616701-A1 PHOTOCURABLE CYCLOBUTARENE COMPOSITIONS THE DOW CHEMICAL COMPANY (US) 1994-09-28 EP disclosed
WO-1993012055-A2 PHOTOCURABLE CYCLOBUTARENE COMPOSITIONS THE DOW CHEMICAL COMPANY (US) 1993-06-24 WO disclosed
EP-0202458-B1 CROSS-LINKED POLYALKENYL PHENOL BASED PHOTORESIST COMPOSITIONS International Business Machines Corporation (US) 1992-03-25 EP disclosed
US-4600683-A Cross-linked polyalkenyl phenol based photoresist compositions INTERNATIONAL BUSINESS MACHINES CORP. (US) 1986-07-15 US disclosed
US-4565767-A Light-sensitive polymer composition with poly(amic acid), bisazide, and tertiary amine compound HITACHI, LTD (JP) 1986-01-21 US disclosed
US-4054454-A Photosensitive copolymer on silicon support RCA CORPORATION (US) 1977-10-18 US disclosed
US-3964909-A Method of preparing a pattern on a silicon wafer RCA CORPORATION (US) 1976-06-22 US disclosed