SCHEMBL5378196

SCHEMBL5378196

C=Cc1ccc(OC(C)OCC)cc1.C=Cc1ccccc1O

nearest known ligand 0.36

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ABL1 P00519 1/20 0.36
ABCB1 P08183 1/20 0.36
BCR P11274 1/20 0.36
CHRNB2 P17787 1/20 0.33
CHRNB4 P30926 1/20 0.33
CHRNA3 P32297 1/20 0.33
CHRNA7 P36544 1/20 0.33
CHRNA4 P43681 1/20 0.33
RELA Q04206 2/20 0.33
LTB4R Q15722 1/20 0.32
LTB4R2 Q9NPC1 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
TAAR1 Q96RJ0 1/20 0.32
TRPA1 O75762 2/20 0.31
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5388961 0.88 ABL1 (0.32) ABL1ABCB1BCRCHRNB2CHRNB4
Indene SCHEMBL2773974 0.87
Styrene SCHEMBL3125335 0.86 TRPA1 (0.36) ABL1ABCB1BCRMEN1KMT2A
SCHEMBL5373112 0.86 ABL1 (0.33) ABL1ABCB1BCRCHRNB2CHRNB4
SCHEMBL134315 0.85 CHRNB2 (0.42) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
4-Vinylphenol SCHEMBL6554378 0.84 RELA (0.39) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL5857566 0.84 KDM4E (0.35) MEN1KMT2ATRPA1TSHR
SCHEMBL6349301 0.84
4-Vinylphenol SCHEMBL8516846 0.84 CHRNB2 (0.38) ABL1ABCB1BCRCHRNB2CHRNB4
SCHEMBL5393323 0.81 CHRNB2 (0.33) ABL1ABCB1BCRCHRNB2CHRNB4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7267923-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-09-11 US disclosed
US-20070148584-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-06-28 US disclosed
US-7005228-B2 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-02-28 US disclosed
US-20030031953-A1 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-02-13 US disclosed