4-Vinylphenol

4-Vinylphenol

SCHEMBL8516846

C=Cc1ccc(O)cc1.C=Cc1ccc(OC(C)OCC)cc1

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 2/20 0.38
CHRNB4 P30926 2/20 0.38
CHRNA3 P32297 2/20 0.38
CHRNA7 P36544 2/20 0.38
CHRNA4 P43681 2/20 0.38
LTA4H P09960 1/20 0.38
ABCG2 Q9UNQ0 3/20 0.37
MAOB P27338 1/20 0.37
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.36
CA9 Q16790 1/20 0.36
CA14 Q9ULX7 1/20 0.36
TTR P02766 2/20 0.35
CYP1A1 P04798 2/20 0.35
ALOX5 P09917 2/20 0.35
PTGS2 P35354 2/20 0.35
CYP1B1 Q16678 2/20 0.35
PTGS1 P23219 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
4-Vinylphenol SCHEMBL6554378 0.94 RELA (0.39) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL134315 0.92 CHRNB2 (0.42) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL23559184 0.88 CHRNB2 (0.40) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL5963165 0.87 LTA4H (0.47) LTA4HCA12CA1CA2CA7
SCHEMBL13469001 0.87 ADRB2 (0.35) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
4-Vinylphenol SCHEMBL29130680 0.86 CA12 (0.35) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL3264447 0.85 APP (0.47) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
4-Vinylphenol SCHEMBL6906320 0.85 ESR1 (0.38) ABCG2MAOBCA12CA1CA2
4-Vinylphenol SCHEMBL7702861 0.85 ELANE (0.41) ABCG2MAOBCA12CA1CA2
SCHEMBL28914735 0.84 CHRNB2 (0.40) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-11286523-A None JP disclosed
CN-112661877-B Polymer and photoresist composition 罗门哈斯电子材料有限责任公司 2023-12-22 CN disclosed
CN-116009353-A Positive photoresist and use method thereof 徐州博康信息化学品有限公司 2023-04-25 CN disclosed
CN-115903387-A Positive photoresist composition and using method thereof 徐州博康信息化学品有限公司 2023-04-04 CN disclosed
CN-115877659-A Chemically amplified positive photoresist and application method thereof 徐州博康信息化学品有限公司 2023-03-31 CN disclosed
CN-115494697-A Chemically amplified photoresist and preparation and use method thereof 徐州博康信息化学品有限公司 2022-12-20 CN disclosed
CN-115421354-A Positive photoresist composition and preparation and use method thereof 徐州博康信息化学品有限公司 2022-12-02 CN disclosed
CN-114114834-A Chemically amplified photoresist and preparation and use method thereof 江苏汉拓光学材料有限公司 2022-03-01 CN disclosed
CN-112661877-A Polymer and photoresist composition 罗门哈斯电子材料有限责任公司 2021-04-16 CN disclosed
US-9366963-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-14 US disclosed
US-20150147697-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-05-28 US disclosed
JP-H11286523-A NEW POLYMER WAKO PURE CHEM IND LTD 1999-10-19 JP disclosed