Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13900356 | 0.84 | ALDH1A1 (0.44) | ALDH1A1 | |
| SCHEMBL27945670 | 0.84 | ALDH1A1 (0.44) | ALDH1A1 | |
| SCHEMBL673273 | 0.80 | ALDH1A1 (0.41) | ALDH1A1 | |
| SCHEMBL47313 | 0.80 | ALDH1A1 (0.41) | ALDH1A1 | |
| SCHEMBL1832545 | 0.79 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL685576 | 0.79 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL685580 | 0.79 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL6912158 | 0.79 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL28137014 | 0.79 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL74808 | 0.79 | ALDH1A1 (0.39) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7232638-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7232638-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-19 | — | — | US | disclosed |
| US-20030224291-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-04 | — | — | US | disclosed |
| US-6492089-B2 | POLYMER BEARING CYCLIC SILICON-CONTAINING GROUPS SUCH AS 1,4,4-TRIMETHYL-4-SILACYCLOHEXYL METHACRYLATE; USE AS CHEMICALLY AMPLIFIED POSITIVE RESIST | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-12-10 | — | — | US | disclosed |
| US-20010003772-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICDL CO., LTD. OF (JP) | 2001-06-14 | — | — | US | disclosed |