Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 3/20 | 0.59 |
| ▸ | TSHR | P16473 | 2/20 | 0.49 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.49 |
| ▸ | BLM | P54132 | 2/20 | 0.48 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | NQO1 | P15559 | 1/20 | 0.47 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.47 |
| ▸ | MGAM | O43451 | 1/20 | 0.44 |
| ▸ | BCHE | P06276 | 2/20 | 0.43 |
| ▸ | TYR | P14679 | 2/20 | 0.43 |
| ▸ | ACHE | P22303 | 2/20 | 0.43 |
| ▸ | SLC22A3 | O75751 | 1/20 | 0.43 |
| ▸ | MAOB | P27338 | 1/20 | 0.43 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30375191 | 1.00 | GAA (0.59) | GAATSHRCYP3A4BLMNFKB1 | |
| SCHEMBL3863574 | 0.88 | GAA (0.48) | GAANPSR1CYP19A1ALDH1A1MAPT | |
| SCHEMBL9009280 | 0.84 | GAA (0.58) | GAATSHRCYP3A4BLMNFKB1 | |
| SCHEMBL2204602 | 0.84 | MAPT (0.60) | GAANPSR1MGAMBCHETYR | |
| SCHEMBL2201624 | 0.82 | TRPA1 (0.47) | GAATSHRCYP3A4BLMNFKB1 | |
| SCHEMBL2203936 | 0.81 | GAA (0.54) | GAATSHRCYP3A4BLMNFKB1 | |
| SCHEMBL30375493 | 0.81 | GAA (0.54) | GAATSHRCYP3A4BLMNFKB1 | |
| SCHEMBL20563424 | 0.80 | TSHR (0.65) | GAATSHRCYP3A4BLMNFKB1 | |
| SCHEMBL2865089 | 0.79 | TSHR (0.56) | GAATSHRCYP3A4BLMNFKB1 | |
| SCHEMBL30826323 | 0.79 | TSHR (0.56) | GAATSHRCYP3A4BLMNFKB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| JP-10218815-A | — | — | None | — | — | JP | disclosed |
| US-8816135-B2 | Trisphenol compound | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2014-08-26 | — | — | US | disclosed |
| US-20120220805-A1 | NOVEL TRISPHENOL COMPUND | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-08-30 | — | — | US | disclosed |
| US-7175960-B2 | photoresists comprising mixtures of alkali-soluble novolaks resin and phenolic compounds esterification with 1,2-naphthoquinonediazidosulfonic acid, having uniformity, high sensitivity and high resolution, and improved heat resistance, film retention, substrate adhesion, and storage stability | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-02-13 | — | — | US | disclosed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | disclosed |
| US-20050058937-A1 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-17 | — | — | US | disclosed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | disclosed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | disclosed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | disclosed |
| EP-1146394-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-10-17 | — | — | EP | disclosed |
| JP-H10218815-A | NEW TRISPHENOL COMPOUND | HONSHU CHEM IND CO LTD | 1998-08-18 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120220805-A1 | NOVEL TRISPHENOL COMPUND | NCOR1, NCOR2, NCOA1 | GAA 4555/4885TSHR 1326/4885CYP3A4 806/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.