Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 4/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | TUBB1 | Q9H4B7 | 6/20 | 0.47 |
| ▸ | TUBB4A | P04350 | 4/20 | 0.47 |
| ▸ | TUBB | P07437 | 4/20 | 0.47 |
| ▸ | TUBA3C | P0DPH7 | 4/20 | 0.47 |
| ▸ | TUBA1B | P68363 | 4/20 | 0.47 |
| ▸ | TUBA4A | P68366 | 4/20 | 0.47 |
| ▸ | TUBB4B | P68371 | 4/20 | 0.47 |
| ▸ | TUBB3 | Q13509 | 4/20 | 0.47 |
| ▸ | TUBB2A | Q13885 | 4/20 | 0.47 |
| ▸ | TUBB8 | Q3ZCM7 | 4/20 | 0.47 |
| ▸ | TUBA3E | Q6PEY2 | 4/20 | 0.47 |
| ▸ | TUBA1A | Q71U36 | 4/20 | 0.47 |
| ▸ | TUBA1C | Q9BQE3 | 4/20 | 0.47 |
| ▸ | TUBB6 | Q9BUF5 | 4/20 | 0.47 |
| ▸ | TUBB2B | Q9BVA1 | 4/20 | 0.47 |
| ▸ | MAPT | P10636 | 6/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5386366 | 0.88 | GAA (0.59) | GAAMAPTALDH1A1SMN1; SMN2KMT2A | |
| SCHEMBL30375191 | 0.88 | GAA (0.59) | GAAMAPTALDH1A1SMN1; SMN2KMT2A | |
| SCHEMBL2201624 | 0.82 | TRPA1 (0.47) | GAAMAPTALDH1A1KMT2AMEN1 | |
| SCHEMBL3865902 | 0.81 | GAA (0.47) | GAAL3MBTL1TUBB1TUBB4ATUBB | |
| SCHEMBL1758822 | 0.78 | TUBB4A (0.59) | GAAL3MBTL1TUBB1TUBB4ATUBB | |
| SCHEMBL2203772 | 0.77 | RAPGEF4 (0.40) | GAAMAPTTDP1POLBALOX15 | |
| SCHEMBL2204602 | 0.75 | MAPT (0.60) | GAAMAPTALDH1A1SMN1; SMN2KMT2A | |
| SCHEMBL4281334 | 0.75 | TUBB1 (0.38) | GAATUBB1TUBB4ATUBBTUBA3C | |
| SCHEMBL2200512 | 0.74 | CYP1A2 (0.47) | MAPTALDH1A1SMN1; SMN2ALOX15ALOX12 | |
| SCHEMBL30375550 | 0.74 | CYP1A2 (0.47) | MAPTALDH1A1SMN1; SMN2ALOX15ALOX12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| CN-113785023-B | Water-based ink composition for reversible thermochromic writing instrument, refill for refill and water-based ballpoint pen incorporating same | 株式会社百乐 | 2023-05-12 | — | — | CN | disclosed |
| US-11640110-B2 | Resin composition, method for producing heat-resistant resin film, and display device | TORAY INDUSTRIES, INC. (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20200192227-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20170299965-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2017-10-19 | — | — | US | disclosed |
| EP-1630605-B1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-11 | — | — | EP | disclosed |
| EP-1496395-B1 | Photosensitive resin precursor composition | TORAY INDUSTRIES (JP) | 2012-06-20 | — | — | EP | disclosed |
| EP-1475665-B1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-7507518-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2009-03-24 | — | — | US | disclosed |
| US-20050014876-A1 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1496395-A2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2005-01-12 | — | — | EP | disclosed |
| EP-1475665-A1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2004-11-10 | — | — | EP | disclosed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | disclosed |
| US-20040197703-A1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2004-10-07 | — | — | US | disclosed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | disclosed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | disclosed |
| EP-1146394-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-10-17 | — | — | EP | disclosed |