Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5388559 | 1.00 | ALDH1A1 (0.31) | ALDH1A1GAAMAPT | |
| SCHEMBL6797198 | 0.78 | ALDH1A1 (0.36) | ALDH1A1GAAMAPT | |
| SCHEMBL22231293 | 0.70 | — | — | |
| SCHEMBL701760 | 0.69 | HSD11B1 (0.33) | — | |
| SCHEMBL1271280 | 0.69 | — | — | |
| SCHEMBL9609343 | 0.68 | ALDH1A1 (0.33) | ALDH1A1GAAMAPT | |
| SCHEMBL701203 | 0.68 | ALDH1A1 (0.31) | ALDH1A1GAAMAPT | |
| SCHEMBL6525185 | 0.67 | — | — | |
| SCHEMBL5675381 | 0.66 | ALDH1A1 (0.39) | ALDH1A1GAAMAPT | |
| SCHEMBL479138 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7241552-B2 | Resist composition comprising photosensitive polymer having lactone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-07-10 | — | — | US | disclosed |
| US-7045267-B2 | Resist composition comprising photosensitive polymer having lactone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-05-16 | — | — | US | disclosed |
| US-20050008975-A1 | Chemical resistance; bonding strength; accuracte patterns; photolithography | YOON KWANG-SUB (KR) | 2005-01-13 | — | — | US | disclosed |
| US-20040018442-A1 | Resist composition comprising photosensitive polymer having lactone in its backbone | YOON KWANG-SUB (KR) | 2004-01-29 | — | — | US | disclosed |
| US-6537727-B2 | Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-03-25 | — | — | US | disclosed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | disclosed |