Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3886364 | 0.83 | TSHR (0.43) | TSHRALDH1A1THRB | |
| SCHEMBL145421 | 0.83 | TSHR (0.43) | TSHRALDH1A1THRB | |
| SCHEMBL25329223 | 0.81 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL6925919 | 0.78 | ALDH1A1 (0.43) | TSHRALDH1A1 | |
| SCHEMBL16537575 | 0.78 | ALDH1A1 (0.43) | TSHRALDH1A1 | |
| SCHEMBL4196691 | 0.77 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL193159 | 0.75 | ALDH1A1 (0.44) | TSHRALDH1A1THRB | |
| SCHEMBL9820071 | 0.75 | TSHR (0.37) | TSHRALDH1A1 | |
| SCHEMBL1772850 | 0.75 | TSHR (0.37) | TSHRALDH1A1THRB | |
| SCHEMBL16537597 | 0.73 | TSHR (0.40) | TSHRALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7232638-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7135269-B2 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-11-14 | — | — | US | disclosed |
| US-20050260521-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-11-24 | — | — | US | disclosed |
| US-6780781-B2 | Method for manufacturing an electronic device | RENESAS TECHNOLOGY CORPORATION (JP) | 2004-08-24 | — | — | US | disclosed |
| US-20030224291-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-04 | — | — | US | disclosed |
| US-20030224560-A1 | Method for manufacturing an electronic device | HITACHI, LTD. | 2003-12-04 | — | — | US | disclosed |
| US-6492089-B2 | POLYMER BEARING CYCLIC SILICON-CONTAINING GROUPS SUCH AS 1,4,4-TRIMETHYL-4-SILACYCLOHEXYL METHACRYLATE; USE AS CHEMICALLY AMPLIFIED POSITIVE RESIST | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-12-10 | — | — | US | disclosed |
| US-20010003772-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICDL CO., LTD. OF (JP) | 2001-06-14 | — | — | US | disclosed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | disclosed |