SCHEMBL53959

SCHEMBL53959

SCc1ncc[nH]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29167191 0.97
SCHEMBL3362078 0.80
SCHEMBL1679282 0.78 TAAR1 (0.64)
SCHEMBL285224 0.78 TERT (0.59)
SCHEMBL6400604 0.77
SCHEMBL7300422 0.76
SCHEMBL7812365 0.75
Bromide SCHEMBL28876753 0.75 TBXAS1 (0.51)
SCHEMBL3030817 0.75 TBXAS1 (0.56)
SCHEMBL131702 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 565 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115584249-B Efficient heat-conducting new energy automobile cooling liquid and preparation method thereof 合肥华清高科表面技术股份有限公司 2025-01-28 CN claimed
CN-117343014-B Preparation method and application of rosin thiourea imidazole quaternary ammonium salt 东北大学 2024-03-01 CN claimed
CN-117555210-A Photoresist stripping liquid composition, preparation method and application thereof 成都三贡化工有限公司 2024-02-13 CN claimed
CN-117343014-A Preparation method and application of rosin thiourea imidazole quaternary ammonium salt 东北大学 2024-01-05 CN claimed
CN-116926523-A Electroless copper plating regulator and preparation method and application thereof 上海天承化学有限公司 2023-10-24 CN claimed
CN-116382046-A Color photoresist stripper composition and stripper composition for silicon oxide film 株式会社东进世美肯 2023-07-04 CN claimed
CN-114231289-A Thin film etching solution, etching method and application thereof TCL华星光电技术有限公司 2022-03-25 CN claimed
US-11092895-B2 Peeling solution composition for dry film resist LTC CO., LTD. (KR) 2021-08-17 US claimed
CN-107924144-B Photoresist stripper composition for manufacturing liquid crystal display LTC有限公司 2020-12-29 CN claimed
US-10859917-B2 Photoresist stripper composition for manufacturing liquid crystal display LTC CO., LTD. (KR) 2020-12-08 US claimed
US-20050048397-A1 Composition and method for removing copper-compatible resist LG.PHILIPS LCD CO., LTD. 2005-03-03 US claimed
EP-0764048-B1 CHROMATOGRAPHY ADSORBENTS UTILIZING MERCAPTO HETEROCYCLIC LIGANDS BIOSEPRA INC (US) 2003-09-24 EP claimed
US-20010014649-A1 CHROMATOGRAPHY ADSORBENTS UTILIZING MERCAPTO HETEROCYCLIC LIGANDS PALL CORPORATION 2001-08-16 US claimed
US-5834446-A USING CYCLODEXTRIN QUEEN'S UNIVERSITY AT KINGSTON (CA) 1998-11-10 US claimed
EP-0764048-A4 CHROMATOGRAPHY ADSORBENTS UTILIZING MERCAPTO HETEROCYCLIC LIGANDS BIOSEPRA INC (US) 1998-03-18 EP claimed
WO-1997049735-A1 NERVE PROCESS GROWTH MODULATORS QUEEN'S UNIVERSITY AT KINGSTON (CA) 1997-12-31 WO claimed
EP-0764048-A1 CHROMATOGRAPHY ADSORBENTS UTILIZING MERCAPTO HETEROCYCLIC LIGANDS BIOSEPRA INC. (US) 1997-03-26 EP claimed
US-5502022-A Chromatography adsorbents utilizing mercapto heterocyclic ligands BIOSEPRA, INC. (US) 1996-03-26 US claimed
WO-1995031279-A1 CHROMATOGRAPHY ADSORBENTS UTILIZING MERCAPTO HETEROCYCLIC LIGANDS BIOSEPRA INC. (US) 1995-11-23 WO claimed
US-4447621-A Use of N-cyano-N'-methyl-N\"-[2-(5-methyl-4-imidazolylmethyldithio)ethyl]guanidine in the preparation of cimetidine SK&F LAB CO. (US) 1984-05-08 US claimed