Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.39 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | HTR2A | P28223 | 1/20 | 0.39 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.39 |
| ▸ | PPARA | Q07869 | 1/20 | 0.39 |
| ▸ | NQO1 | P15559 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | MAOB | P27338 | 2/20 | 0.34 |
| ▸ | MAOA | P21397 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9456863 | 0.89 | NQO1 (0.43) | TSHRNQO1ALDH1A1KDM4EKMT2A | |
| SCHEMBL9457168 | 0.83 | NQO1 (0.39) | CYP1A2CYP3A4NQO1ALDH1A1HPGD | |
| SCHEMBL27499462 | 0.81 | CA1 (0.48) | CYP3A4ALDH1A1KDM4EKMT2ANPC1 | |
| SCHEMBL5393983 | 0.81 | ACHE (0.41) | CYP3A4TSHRNQO1ALDH1A1POLB | |
| SCHEMBL5394760 | 0.79 | LTA4H (0.48) | CYP1A2CYP3A4TSHRHTR2ANQO1 | |
| SCHEMBL10627313 | 0.79 | SMN1; SMN2 (0.39) | NQO1ALDH1A1HPGDCYP2C19NPC1 | |
| SCHEMBL5405657 | 0.79 | TDP1 (0.54) | CYP1A2CYP3A4TSHRNQO1ALDH1A1 | |
| SCHEMBL766451 | 0.78 | LTA4H (0.43) | TSHRALDH1A1HPGDKDM4ENPC1 | |
| SCHEMBL13861932 | 0.76 | RAB9A (0.45) | CYP1A2ALDH1A1HPGDKDM4ECYP2C9 | |
| SCHEMBL10879582 | 0.76 | HPGD (0.41) | CYP1A2CYP3A4PPARAHPGDMAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115449279-A | Conductive coating liquid composition and transparent conductive film for flexible display including conductive layer produced therefrom | 爱思开希高科技材料有限公司 | 2022-12-09 | — | — | CN | disclosed |
| CN-101639628-B | Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element | JSR CORP JP | 2013-04-03 | — | — | CN | disclosed |
| CN-101324755-B | Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof | JSR CORP | 2012-10-03 | — | — | CN | disclosed |
| CN-101226329-B | Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof | JSR CORP | 2012-09-05 | — | — | CN | disclosed |
| CN-101515113-B | Radioactive ray sensibility resin composition, interlayer insulating film, microlens and method of forming the same | JSR CORP | 2012-07-18 | — | — | CN | disclosed |
| CN-101639628-A | Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element | JSR CORP JP | 2010-02-03 | — | — | CN | disclosed |
| CN-101515113-A | Radioactive ray sensibility resin composition, interlayer insulating film, microlens and method of forming the same | JSR CORP (JP) | 2009-08-26 | — | — | CN | disclosed |
| CN-101324755-A | Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof | JSR CORP (JP) | 2008-12-17 | — | — | CN | disclosed |
| CN-100430828-C | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORP (JP) | 2008-11-05 | — | — | CN | disclosed |
| CN-101226329-A | Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof | JSR CORP (JP) | 2008-07-23 | — | — | CN | disclosed |
| US-7205085-B2 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2007-04-17 | — | — | US | disclosed |
| US-7125647-B2 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2006-10-24 | — | — | US | disclosed |
| US-20060210929-A1 | Photosensitive composition and forming process of structured material using the composition | CANON KABUSHIKI KAISHA (JP) | 2006-09-21 | — | — | US | disclosed |
| CN-1582414-A | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORP (JP) | 2005-02-16 | — | — | CN | disclosed |
| EP-1413924-A1 | COMPOSITION HAVING PERMITIVITY BEING RADIATION-SENSITIVELY CHANGEABLE AND METHOD FOR FORMING PERMITIVITY PATTERN | JSR Corporation (JP) | 2004-04-28 | — | — | EP | disclosed |
| US-20040005506-A1 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2004-01-08 | — | — | US | disclosed |
| EP-1375597-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND UTILIZATION THEREOF | JSR Corporation (JP) | 2004-01-02 | — | — | EP | disclosed |
| CN-1462298-A | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORP (JP) | 2003-12-17 | — | — | CN | disclosed |
| US-20030171468-A1 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |