Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 6/20 | 0.54 |
| ▸ | TSHR | P16473 | 2/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.41 |
| ▸ | MAPT | P10636 | 5/20 | 0.39 |
| ▸ | NPC1 | O15118 | 3/20 | 0.39 |
| ▸ | RAB9A | P51151 | 3/20 | 0.39 |
| ▸ | TEAD4 | Q15561 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | MITF | O75030 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | GFER | P55789 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.38 |
| ▸ | NOD2 | Q9HC29 | 1/20 | 0.38 |
| ▸ | MAOA | P21397 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9456863 | 0.89 | NQO1 (0.43) | TDP1TSHRALDH1A1SMN1; SMN2KMT2A | |
| SCHEMBL9457168 | 0.83 | NQO1 (0.39) | TDP1ALDH1A1CYP3A4MAPTNPC1 | |
| SCHEMBL27499462 | 0.81 | CA1 (0.48) | TDP1MAPK1ALDH1A1CYP3A4MAPT | |
| SCHEMBL5393983 | 0.81 | ACHE (0.41) | TDP1TSHRALDH1A1CYP3A4MAPT | |
| SCHEMBL20653104 | 0.79 | ALDH1A1 (0.55) | TDP1TSHRMAPK1ALDH1A1CYP3A4 | |
| SCHEMBL5400910 | 0.79 | CYP1A2 (0.39) | TSHRALDH1A1CYP3A4MAPTNPC1 | |
| SCHEMBL5394760 | 0.79 | LTA4H (0.48) | TSHRMAPK1ALDH1A1CYP3A4MAPT | |
| SCHEMBL10627313 | 0.79 | SMN1; SMN2 (0.39) | TDP1ALDH1A1MAPTNPC1RAB9A | |
| SCHEMBL766451 | 0.78 | LTA4H (0.43) | TSHRMAPK1ALDH1A1MAPTNPC1 | |
| SCHEMBL13861932 | 0.76 | RAB9A (0.45) | TDP1MAPK1ALDH1A1NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110099974-B | Composition for forming protective layer on substrate | 日产化学株式会社 | 2022-02-25 | — | — | CN | disclosed |
| CN-111423813-B | Composition for forming release layer and release layer | 日产化学工业株式会社 | 2021-11-23 | — | — | CN | disclosed |
| CN-107406675-B | Composition for forming release layer and release layer | 日产化学工业株式会社 | 2020-11-06 | — | — | CN | disclosed |
| CN-111423813-A | Composition for forming release layer and release layer | 日产化学工业株式会社 | 2020-07-17 | — | — | CN | disclosed |
| US-7205085-B2 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2007-04-17 | — | — | US | disclosed |
| US-7125647-B2 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2006-10-24 | — | — | US | disclosed |
| EP-1413924-A1 | COMPOSITION HAVING PERMITIVITY BEING RADIATION-SENSITIVELY CHANGEABLE AND METHOD FOR FORMING PERMITIVITY PATTERN | JSR Corporation (JP) | 2004-04-28 | — | — | EP | disclosed |
| US-20040005506-A1 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2004-01-08 | — | — | US | disclosed |
| EP-1375597-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND UTILIZATION THEREOF | JSR Corporation (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030171468-A1 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| CN-1032477-C | Composition for use as coating or facing of portland cement concrete or metal | ROHM & HAAS (US) | 1996-08-07 | — | — | CN | disclosed |
| CN-1052496-A | Aqueous composition with good chemerosiveness resistent and resistance to sudden heating and thick film curing performance | ROHM & HAAS (US) | 1991-06-26 | — | — | CN | disclosed |