SCHEMBL6858086

SCHEMBL6858086

FC(F)(F)[C]1CC2CCC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5401050 0.76 SLC6A3 (0.30)
SCHEMBL30394118 0.71
SCHEMBL563167 0.67
SCHEMBL9186090 0.62
SCHEMBL21995884 0.62 SLC6A3 (0.33)
SCHEMBL383904 0.62
SCHEMBL3537331 0.62
SCHEMBL21086749 0.62
SCHEMBL21332245 0.62
SCHEMBL11342488 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6800418-B2 ALLOWING DEVELOPMENT WITH CONVENTIONAL DEVELOPERS AND HAVING A HIGH TRANSMITTANCE AT A F2 EXCIMER LASER WAVELENGTH OF 157 NM, HYDROPHILICITY, ADHESION TO UNDERLAYER SAMSUNG ELECTRONICS (KR) 2004-10-05 US disclosed
US-20030157430-A1 Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same SAMSUNG ELECTRONICS CO., LTD. 2003-08-21 US disclosed