Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | METAP2 | P50579 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8483278 | 1.00 | METAP2 (0.31) | METAP2 | |
| SCHEMBL2856266 | 0.80 | — | — | |
| SCHEMBL11774495 | 0.73 | — | — | |
| SCHEMBL221185 | 0.73 | LMNA (0.37) | — | |
| SCHEMBL8241582 | 0.73 | LMNA (0.37) | — | |
| SCHEMBL9862354 | 0.73 | LMNA (0.37) | — | |
| SCHEMBL9862355 | 0.73 | LMNA (0.37) | — | |
| SCHEMBL2826604 | 0.73 | LMNA (0.37) | — | |
| Water SCHEMBL890485 | 0.71 | ALDH1A1 (0.36) | — | |
| SCHEMBL20043533 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2003093287-A1 | NOVEL METHOD FOR PREPARING ALPHA-GLYCOSYLCERAMIDES, NOVEL ALPHA-GLYCOSYLCERAMIDE DERIVATIVES AND THEIR USES | INSTITUT PASTEUR (FR) | 2003-11-13 | — | — | WO | claimed |
| US-7163781-B2 | Process for producing a semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7119156-B2 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-10-10 | — | — | US | disclosed |
| US-7070905-B2 | Pattern forming process | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-07-04 | — | — | US | disclosed |
| US-7063932-B2 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-06-20 | — | — | US | disclosed |
| US-7029823-B2 | Resist composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-04-18 | — | — | US | disclosed |
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20050048400-A1 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-03-03 | — | — | US | disclosed |
| US-20050037283-A1 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-02-17 | — | — | US | disclosed |
| US-20050037284-A1 | Polymer; radiation transparent pattern against short wavelengths and etching resistance; semiconductors | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-02-17 | — | — | US | disclosed |
| WO-2003093287-A1 | NOVEL METHOD FOR PREPARING ALPHA-GLYCOSYLCERAMIDES, NOVEL ALPHA-GLYCOSYLCERAMIDE DERIVATIVES AND THEIR USES | INSTITUT PASTEUR (FR) | 2003-11-13 | — | — | WO | disclosed |
| US-20030149225-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-08-07 | — | — | US | disclosed |
| US-6541597-B2 | Resist resin having in its structure a bridged bond containing aliphatic ring; pattern excellent in transparency against short wavelength light and dry-etching resistance can be formed by alkali development with high resolution. | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20020098441-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-25 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
| US-6077644-A | Positive-working resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-06-20 | — | — | US | disclosed |
| US-5929271-A | Compounds for use in a positive-working resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5856497-A | Asymmetric synthesis of α-cycloalkylalkyl substituted methanamines | BOEHRINGER INGELHEIM PHARMACEUTICALS, INC. (US) | 1999-01-05 | — | — | US | disclosed |
| EP-0781750-A2 | Asymmetric synthesis of alpha-cycloalkylalkyl substituted methanamines | BOEHRINGER INGELHEIM PHARMACEUTICALS INC. (US) | 1997-07-02 | — | — | EP | disclosed |
| US-5510538-A | USING O-IODOXYBENZOIC ACID AS OXIDIZING AGENT | SIGMA-TAU INDUSTRIE FARMACEUTICHE RIUNITE S.P.A. (IT) | 1996-04-23 | — | — | US | disclosed |