SCHEMBL540360

SCHEMBL540360

CC(C=CC(N)=O)CC=CC(N)=O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.36
MAPT P10636 1/20 0.36
CHRNB2 P17787 2/20 0.34
CHRNB4 P30926 2/20 0.34
CHRNA3 P32297 2/20 0.34
CHRNA4 P43681 2/20 0.34
GABRP O00591 2/20 0.32
GABRD O14764 2/20 0.32
GABRA1 P14867 2/20 0.32
GABRB1 P18505 2/20 0.32
GABRG2 P18507 2/20 0.32
GABRB3 P28472 2/20 0.32
GABRA5 P31644 2/20 0.32
GABRA3 P34903 2/20 0.32
GABRA2 P47869 2/20 0.32
GABRB2 P47870 2/20 0.32
GABRA4 P48169 2/20 0.32
GABRE P78334 2/20 0.32
GABRA6 Q16445 2/20 0.32
GABRG1 Q8N1C3 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16134038 0.79
SCHEMBL3920127 0.79
SCHEMBL18294833 0.79
SCHEMBL9607828 0.77
SCHEMBL7610787 0.77
SCHEMBL17183721 0.77
SCHEMBL5983404 0.77
SCHEMBL1592292 0.76 GABRP (0.48) ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA4
SCHEMBL17183781 0.76 SLC7A5 (0.38) ALDH1A1MAPTGABRPGABRDGABRA1
SCHEMBL30874300 0.75 ALDH1A1 (0.35) ALDH1A1MAPTCHRNB2CHRNB4CHRNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119907921-A Engineered particles as red blood cell mimics for hematology and compositions containing the same 弹弓生物科学公司 2025-04-29 CN claimed
CN-119000831-A CO based on hydrogel structure2Gas sensor, method for producing the same and use thereof 华东理工大学 2024-11-22 CN claimed
CN-118281300-A Electrochemical device, method of manufacturing the same, and electronic apparatus 远景动力技术(江苏)有限公司 2024-07-02 CN claimed
CN-122060716-A Preparation method of nano enzyme material, composite composition and application thereof 厦门瑞聚医学科技有限公司 2026-05-19 CN disclosed
CN-122005907-A Enzyme polymer composite composition and application thereof 厦门瑞聚医学科技有限公司 2026-05-12 CN disclosed
CN-119000831-A CO based on hydrogel structure2Gas sensor, method for producing the same and use thereof 华东理工大学 2024-11-22 CN disclosed
CN-118355112-A Hydrogel particles as feeder cells and as synthetic antigen presenting cells 弹弓生物科学公司 2024-07-16 CN disclosed
CN-118281300-A Electrochemical device, method of manufacturing the same, and electronic apparatus 远景动力技术(江苏)有限公司 2024-07-02 CN disclosed
CN-114980996-B Super-hydrophilic filter for oil-water separation and method for manufacturing the same 浦项工科大学校产学协力团 2024-06-14 CN disclosed
WO-2024061803-A1 ELECTROCHEMICAL CELL COMPRISING A POLYMER ELECTROLYTE AND A NICKEL-BASED CATHODE ACTIVE MATERIAL UMICORE (BE) 2024-03-28 WO disclosed
WO-2024061797-A1 POLYMER ELECTROLYTE COMPRISING A POLYACRYLAMIDE AND METHODS FOR THE PRODUCTION THEREOF UMICORE (BE) 2024-03-28 WO disclosed
EP-0167373-A2 Element for electrophoresis FUJI PHOTO FILM CO., LTD. (JP) 1986-01-08 EP disclosed
EP-0162693-A2 Medium for electrophoresis FUJI PHOTO FILM CO., LTD. (JP) 1985-11-27 EP disclosed
EP-0162657-A2 Element for electrophoresis FUJI PHOTO FILM CO., LTD. (JP) 1985-11-27 EP disclosed
EP-0155833-A2 Element for electrophoresis FUJI PHOTO FILM CO., LTD. (JP) 1985-09-25 EP disclosed
US-4258121-A SULFONYLOXY N-SUBSTITUTED IMIDES AS PHOTOINITIATORS FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 US disclosed
US-4220704-A Water soluble photosensitive resin compositions comprising a polyamide or its salt TOYOBO CO., LTD. (JP) 1980-09-02 US disclosed
US-4187112-A Photosensitive plate containing nitrogen containing condensation type polyesters TOYOBO CO., LTD. (JP) 1980-02-05 US disclosed
US-4157995-A HIGH MOLECULAR WEIGHT ADDITION POLYMER BASF AKTIENGESELLSCHAFT (DE) 1979-06-12 US disclosed
US-4145222-A Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt TOYOBO CO., LTD. (JP) 1979-03-20 US disclosed