SCHEMBL540360

SCHEMBL540360

CC(C=CC(N)=O)CC=CC(N)=O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 1/20 0.36
▸ MAPT P10636 1/20 0.36
▸ CHRNB2 P17787 2/20 0.34
▸ CHRNB4 P30926 2/20 0.34
▸ CHRNA3 P32297 2/20 0.34
▸ CHRNA4 P43681 2/20 0.34
▸ GABRP O00591 2/20 0.32
▸ GABRD O14764 2/20 0.32
▸ GABRA1 P14867 2/20 0.32
▸ GABRB1 P18505 2/20 0.32
▸ GABRG2 P18507 2/20 0.32
▸ GABRB3 P28472 2/20 0.32
▸ GABRA5 P31644 2/20 0.32
▸ GABRA3 P34903 2/20 0.32
▸ GABRA2 P47869 2/20 0.32
▸ GABRB2 P47870 2/20 0.32
▸ GABRA4 P48169 2/20 0.32
▸ GABRE P78334 2/20 0.32
▸ GABRA6 Q16445 2/20 0.32
▸ GABRG1 Q8N1C3 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18294833 0.79 — —
SCHEMBL3920127 0.79 — —
SCHEMBL16134038 0.79 — —
SCHEMBL9607828 0.77 — —
SCHEMBL7610787 0.77 — —
SCHEMBL17183721 0.77 — —
SCHEMBL5983404 0.77 — —
SCHEMBL1592292 0.76 GABRP (0.48) ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA4
SCHEMBL17183781 0.76 SLC7A5 (0.38) ALDH1A1MAPTGABRPGABRDGABRA1
SCHEMBL30874300 0.75 ALDH1A1 (0.35) ALDH1A1MAPTCHRNB2CHRNB4CHRNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119907921-A Engineered particles as red blood cell mimics for hematology and compositions containing the same 弹弓生物科学公司 2025-04-29 — — CN claimed
CN-119000831-A CO based on hydrogel structure2Gas sensor, method for producing the same and use thereof 华东理工大学 2024-11-22 — — CN claimed
CN-118281300-A Electrochemical device, method of manufacturing the same, and electronic apparatus 远景动力技术(江苏)有限公司 2024-07-02 — — CN claimed
CN-122060716-A Preparation method of nano enzyme material, composite composition and application thereof 厦门瑞聚医学科技有限公司 2026-05-19 — — CN disclosed
CN-122005907-A Enzyme polymer composite composition and application thereof 厦门瑞聚医学科技有限公司 2026-05-12 — — CN disclosed
CN-119000831-A CO based on hydrogel structure2Gas sensor, method for producing the same and use thereof 华东理工大学 2024-11-22 — — CN disclosed
CN-118355112-A Hydrogel particles as feeder cells and as synthetic antigen presenting cells 弹弓生物科学公司 2024-07-16 — — CN disclosed
CN-118281300-A Electrochemical device, method of manufacturing the same, and electronic apparatus 远景动力技术(江苏)有限公司 2024-07-02 — — CN disclosed
CN-114980996-B Super-hydrophilic filter for oil-water separation and method for manufacturing the same 浦项工科大学校产学协力团 2024-06-14 — — CN disclosed
WO-2024061803-A1 ELECTROCHEMICAL CELL COMPRISING A POLYMER ELECTROLYTE AND A NICKEL-BASED CATHODE ACTIVE MATERIAL UMICORE (BE) 2024-03-28 — — WO disclosed
WO-2024061797-A1 POLYMER ELECTROLYTE COMPRISING A POLYACRYLAMIDE AND METHODS FOR THE PRODUCTION THEREOF UMICORE (BE) 2024-03-28 — — WO disclosed
EP-0167373-A2 Element for electrophoresis FUJI PHOTO FILM CO., LTD. (JP) 1986-01-08 — — EP disclosed
EP-0162693-A2 Medium for electrophoresis FUJI PHOTO FILM CO., LTD. (JP) 1985-11-27 — — EP disclosed
EP-0162657-A2 Element for electrophoresis FUJI PHOTO FILM CO., LTD. (JP) 1985-11-27 — — EP disclosed
EP-0155833-A2 Element for electrophoresis FUJI PHOTO FILM CO., LTD. (JP) 1985-09-25 — — EP disclosed
US-4258121-A SULFONYLOXY N-SUBSTITUTED IMIDES AS PHOTOINITIATORS FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 — — US disclosed
US-4220704-A Water soluble photosensitive resin compositions comprising a polyamide or its salt TOYOBO CO., LTD. (JP) 1980-09-02 — — US disclosed
US-4187112-A Photosensitive plate containing nitrogen containing condensation type polyesters TOYOBO CO., LTD. (JP) 1980-02-05 — — US disclosed
US-4157995-A HIGH MOLECULAR WEIGHT ADDITION POLYMER BASF AKTIENGESELLSCHAFT (DE) 1979-06-12 — — US disclosed
US-4145222-A Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt TOYOBO CO., LTD. (JP) 1979-03-20 — — US disclosed
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