Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 8/20 | 0.44 |
| ▸ | CA1 | P00915 | 5/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.36 |
| ▸ | FFAR4 | Q5NUL3 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | PLK1 | P53350 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.34 |
| ▸ | GPR183 | P32249 | 1/20 | 0.33 |
| ▸ | CNR2 | P34972 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5403721 | 0.94 | CA2 (0.40) | CA2CA1L3MBTL1ALDH1A1KMT2A | |
| SCHEMBL5408516 | 0.88 | CA2 (0.41) | CA2CA1L3MBTL1ALDH1A1LMNA | |
| SCHEMBL5419102 | 0.86 | CA2 (0.42) | CA2CA1FFAR4SMN1; SMN2ALDH1A1 | |
| SCHEMBL5408941 | 0.82 | CA2 (0.37) | CA2CA1L3MBTL1ALDH1A1LMNA | |
| SCHEMBL5411399 | 0.82 | CA2 (0.44) | CA2CA1L3MBTL1FFAR4SMN1; SMN2 | |
| SCHEMBL6280204 | 0.79 | CA2 (0.36) | CA2CA1FFAR4LMNACNR2 | |
| SCHEMBL5408495 | 0.79 | GAA (0.38) | CA2CA1L3MBTL1SMN1; SMN2ALDH1A1 | |
| SCHEMBL3204378 | 0.78 | KAT6A (0.33) | CA2CA1CNR2 | |
| SCHEMBL6280199 | 0.77 | NR1I2 (0.35) | CA2SMN1; SMN2MEN1KMT2A | |
| SCHEMBL5421312 | 0.76 | ALDH1A1 (0.38) | SMN1; SMN2ALDH1A1LMNAMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |