SCHEMBL5404359

SCHEMBL5404359

CCC(CC)C1C2CC3CC(C2)CC1C3

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
EPHX2 P34913 1/20 0.31
HSD11B1 P28845 1/20 0.30
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5410703 0.77 EPHX1 (0.33) CYP2C9L3MBTL1EPHX2EPHX1
SCHEMBL353657 0.72
SCHEMBL5411974 0.70 SHBG (0.35)
SCHEMBL3927216 0.70
SCHEMBL677067 0.69 MEN1 (0.39) CYP2C9EPHX2EPHX1
Ammonia Solution, Strong SCHEMBL353658 0.69 EPHX1 (0.31) EPHX1
SCHEMBL3617876 0.68 L3MBTL1 (0.37) L3MBTL1EPHX2HSD11B1EPHX1
SCHEMBL14055078 0.67 L3MBTL1 (0.32) L3MBTL1EPHX2
Adamantane SCHEMBL15536146 0.66 ALDH1A1 (0.50) CYP2C9L3MBTL1
SCHEMBL24270380 0.65 CYP2C9 (0.40) CYP2C9EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7192684-B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-20 US disclosed
US-20040067436-A1 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed