SCHEMBL5406919

SCHEMBL5406919

CCc1ccc([I+]c2ccc(CC)cc2)cc1.O=S(=O)([O-])c1ccc(F)cc1F

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.39
ALDH1A1 P00352 1/20 0.36
MAPT P10636 1/20 0.36
CA2 P00918 1/20 0.36
HTR6 P50406 1/20 0.35
POLB P06746 1/20 0.35
CTDSP1 Q9GZU7 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
LMNA P02545 1/20 0.35
HTR2A P28223 1/20 0.35
HTR2C P28335 1/20 0.35
METAP2 P50579 1/20 0.34
KDM2B Q8NHM5 1/20 0.34
CCR2 P41597 1/20 0.33
AKR1B1 P15121 1/20 0.33
CXCR4 P61073 1/20 0.33
P2RY4 P51582 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
KCNH2 Q12809 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5403588 0.89 CA2 (0.39) GAAALDH1A1MAPTCA2HTR6
Toliodium SCHEMBL5403487 0.84 MAPT (0.38) ALDH1A1MAPTPOLBCCR2AKR1B1
SCHEMBL5422313 0.83 KAT6A (0.39) GAAALDH1A1MAPTCA2TDP1
SCHEMBL5398687 0.83 NPC1 (0.34) ALDH1A1MAPTLMNAKDM2BCCR2
SCHEMBL503803 0.82 GAA (0.40) GAAALDH1A1MAPTCCR2AKR1B1
SCHEMBL30827110 0.82 GAA (0.40) GAAALDH1A1MAPTCCR2AKR1B1
SCHEMBL30113133 0.81 HTR2A (0.38) ALDH1A1MAPTPOLBHTR2AHTR2C
SCHEMBL548574 0.81 HTR2A (0.38) ALDH1A1MAPTPOLBHTR2AHTR2C
SCHEMBL5413750 0.81 CA2 (0.44) GAAALDH1A1MAPTCA2POLB
SCHEMBL5403652 0.81 PSEN1 (0.36) GAAALDH1A1MAPTHTR6LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed