Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | SLC22A12 | Q96S37 | 7/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.36 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.36 |
| ▸ | SLC22A11 | Q9NSA0 | 1/20 | 0.36 |
| ▸ | NPY1R | P25929 | 1/20 | 0.36 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.36 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.35 |
| ▸ | CNR2 | P34972 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5422186 | 0.90 | FFAR4 (0.41) | HSD11B1ALDH1A1SLC22A12MEN1KMT2A | |
| SCHEMBL5411395 | 0.83 | KAT6A (0.41) | ALDH1A1CA2MEN1KMT2ACNR2 | |
| Toliodium SCHEMBL2901082 | 0.82 | SLC22A12 (0.47) | HSD11B1ALDH1A1SLC22A12MEN1KMT2A | |
| SCHEMBL5405451 | 0.82 | HSD11B1 (0.43) | HSD11B1ALDH1A1SLC22A12MEN1KMT2A | |
| SCHEMBL455243 | 0.82 | MEN1 (0.46) | HSD11B1ALDH1A1SLC22A12MEN1KMT2A | |
| SCHEMBL31210331 | 0.81 | HSD11B1 (0.47) | HSD11B1ALDH1A1CA2SLC22A12MEN1 | |
| SCHEMBL453146 | 0.81 | HSD11B1 (0.47) | HSD11B1ALDH1A1CA2SLC22A12MEN1 | |
| SCHEMBL2898439 | 0.81 | HSD11B1 (0.46) | HSD11B1ALDH1A1SLC22A12MEN1KMT2A | |
| SCHEMBL4419124 | 0.80 | KDM1A (0.44) | HSD11B1SLC22A12MEN1KMT2ACYP2C9 | |
| SCHEMBL5416321 | 0.79 | HSD11B1 (0.39) | HSD11B1ALDH1A1SLC22A12MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |