SCHEMBL5418178

SCHEMBL5418178

C=C(C)C(=O)Oc1ccc(C(CC)c2ccc(OC(=O)C(=C)C)cc2OCC(C)O)c(OCC(C)O)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.39
LMNA P02545 1/20 0.36
GPR88 Q9GZN0 2/20 0.35
KMT2A Q03164 1/20 0.34
ATM Q13315 1/20 0.34
KDM4E B2RXH2 3/20 0.34
TDP1 Q9NUW8 2/20 0.33
RXRA P19793 1/20 0.33
RXRB P28702 1/20 0.33
RXRG P48443 1/20 0.33
CYP2C19 P33261 1/20 0.33
POLB P06746 1/20 0.33
APEX1 P27695 1/20 0.33
HTT P42858 1/20 0.33
TTR P02766 1/20 0.33
FFAR1 O14842 1/20 0.33
HIF1A Q16665 1/20 0.32
AKR1C3 P42330 1/20 0.32
AKR1C2 P52895 1/20 0.32
ALDH1A1 P00352 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10632078 0.90 ELANE (0.36) ELANELMNAGPR88KMT2AKDM4E
SCHEMBL7576563 0.89 ELANE (0.43) ELANELMNAKMT2AATMKDM4E
SCHEMBL28807130 0.88 ELANE (0.38) ELANEGPR88KMT2AATMKDM4E
SCHEMBL10632085 0.86 ELANE (0.36) ELANEGPR88KMT2AATMKDM4E
SCHEMBL10630805 0.84 THRB (0.41) ELANELMNAGPR88RXRARXRB
SCHEMBL10628782 0.81 LMNA (0.39) LMNAGPR88KMT2AKDM4ERXRA
SCHEMBL8409499 0.81 TSHR (0.39) ELANELMNAKMT2AATMKDM4E
SCHEMBL8850353 0.81 ELANE (0.41) ELANEKMT2AATMKDM4ETDP1
SCHEMBL346348 0.80 ELANE (0.37) ELANELMNAKMT2AATMKDM4E
SCHEMBL10204647 0.78 LMNA (0.51) ELANELMNAKMT2AATMKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0951896-B1 Radically polymerizable dental material IVOCLAR VIVADENT AG (LI) 2005-12-21 EP claimed
US-6281271-B1 BLEND OF POLYMER AND FILLER IVOCLAR AG (LI) 2001-08-28 US claimed
EP-0951896-A2 Radically polymerizable dental material IVOCLAR AG (LI) 1999-10-27 EP claimed
US-5607985-A BENZOYL PHOSPHINE OXIDE, CAMPHORQUINONE ADELL CO., LTD. (JP) 1997-03-04 US claimed
CN-114072439-B Curable composition and resin composition for photofabrication comprising same 株式会社可乐丽 2024-05-14 CN disclosed
CN-113993497-B Curable composition and resin composition for photofabrication comprising same 株式会社可乐丽 2024-03-22 CN disclosed
CN-114929158-A Method for producing a denture, curable composition for photo-molding, and kit for producing a denture 株式会社德山齿科 2022-08-19 CN disclosed
CN-109803989-B Composition for optical three-dimensional molding 可乐丽则武齿科株式会社 2022-03-08 CN disclosed
CN-114072439-A Curable composition and resin composition for stereolithography comprising same 株式会社可乐丽 2022-02-18 CN disclosed
CN-113993497-A Curable composition and resin composition for stereolithography comprising same 株式会社可乐丽 2022-01-28 CN disclosed
CN-108024913-B Curable composition, curable composition for dentistry, and organic-inorganic composite particle for dentistry 德山齿科株式会社 2021-08-10 CN disclosed
US-7278849-B2 Dental prosthesis with metal-free anchoring elements IVOCLAR VIVADENT AG (LI) 2007-10-09 US disclosed
EP-0951896-A2 Radically polymerizable dental material IVOCLAR AG (LI) 1999-10-27 EP disclosed
EP-0627476-B1 PHOTOPOLYMERIZATION INITIATOR COMPOSITION FOR VISIBLE RAY POLYMERIZABLE ADHESIVE ADELL CO LTD (JP) 1999-08-04 EP disclosed
US-5607985-A BENZOYL PHOSPHINE OXIDE, CAMPHORQUINONE ADELL CO., LTD. (JP) 1997-03-04 US disclosed
EP-0627476-A1 PHOTOPOLYMERIZATION INITIATOR COMPOSITION FOR VISIBLE RAY POLYMERIZABLE ADHESIVE ADELL CO., LTD. (JP) 1994-12-07 EP disclosed
US-4774035-A WEAR RESISTANCE CAMELOT INDUSTRIES CORPORATION (US) 1988-09-27 US disclosed
US-4273799-A POLYFUNCTIONAL MONOMERS CONTAINING (METH)ACRYLOYLOXY GROUPS MITSUBISHI RAYON CO., LTD. (JP) 1981-06-16 US disclosed
US-4273802-A POLYFUNCTIONAL MONOMERS CONTAINING (METH)ACRYLOYLOXY GROUPS MITSUBISHI RAYON CO., LTD. (JP) 1981-06-16 US disclosed
US-4199421-A Coating composition and a method for producing a synthetic resin molded product having an abrasion resistant surface MITSUBISHI RAYON COMPANY, LIMITED (JP) 1980-04-22 US disclosed