SCHEMBL5836801

SCHEMBL5836801

CC(C)(C)OC(=O)C12C[C]3CC(CC(C3)C1)C2

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 4/20 0.44
CYP19A1 P11511 4/20 0.44
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
MAPK1 P28482 1/20 0.38
EPHX2 P34913 2/20 0.35
GAA P10253 1/20 0.35
MAPT P10636 1/20 0.35
XBP1 P17861 1/20 0.35
ALOX15 P16050 1/20 0.33
LMNA P02545 1/20 0.33
GLA P06280 1/20 0.33
SCN1A P35498 1/20 0.33
SCN2A Q99250 1/20 0.33
SCN3A Q9NY46 1/20 0.33
RAB9A P51151 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1772638 0.83 GLA (0.42) CYP17A1CYP19A1MEN1KMT2AGAA
SCHEMBL131064 0.82 CYP17A1 (0.55) CYP17A1CYP19A1MEN1KMT2AMAPK1
SCHEMBL136663 0.79 NPSR1 (0.49) CYP17A1CYP19A1MEN1KMT2AMAPK1
SCHEMBL30798137 0.78 CYP17A1 (0.46) CYP17A1CYP19A1MEN1KMT2AMAPK1
SCHEMBL1772267 0.74 L3MBTL1 (0.39) MEN1KMT2AGAAMAPTXBP1
SCHEMBL5080907 0.74 CYP17A1 (0.41) CYP17A1CYP19A1MEN1KMT2AMAPK1
SCHEMBL5437290 0.74 CYP17A1 (0.43) CYP17A1CYP19A1MEN1KMT2AMAPK1
SCHEMBL2338250 0.73 POLB (0.42) CYP17A1CYP19A1MEN1KMT2AMAPK1
SCHEMBL133074 0.73 ALDH1A1 (0.49) CYP17A1CYP19A1RAB9A
SCHEMBL5568146 0.73 ALDH1A1 (0.44) CYP17A1CYP19A1MEN1KMT2AMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7108955-B2 Polysiloxane, process for production thereof and radiation-sensitive resin composition JSR CORPORATION (JP) 2006-09-19 US disclosed
CN-1249126-C Polysiloxane, process for production thereof and radiation-sensitive resin composition JSR CORP (JP) 2006-04-05 CN disclosed
US-20040143082-A1 Polysiloxane, process for production thereof and radiation-sensitive resin composition JSR CORPORATION (JP) 2004-07-22 US disclosed
CN-1505651-A Polysiloxane, process for production thereof and radiation-sensitive resin composition JSR��ʽ���� 2004-06-16 CN disclosed
EP-1398339-A1 POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2004-03-17 EP disclosed