Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.54 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.39 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.39 |
| ▸ | PGR | P06401 | 1/20 | 0.39 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.39 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.39 |
| ▸ | HTR1A | P08908 | 1/20 | 0.39 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.39 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.39 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.39 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.39 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.39 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Triethylene Glycol SCHEMBL545518 | 0.96 | TSHR (0.54) | TSHRALDH1A1MEN1KMT2AMAPK1 | |
| Acetic Acid SCHEMBL2688979 | 0.94 | TSHR (0.48) | TSHRALDH1A1MEN1KMT2AMAPK1 | |
| Ethylene Glycol SCHEMBL545519 | 0.94 | ALDH1A1 (0.56) | TSHRALDH1A1MEN1KMT2ACHRM5 | |
| Diethylene Glycol Monoethyl Ether SCHEMBL28082957 | 0.93 | ALDH1A1 (0.68) | TSHRALDH1A1MEN1KMT2AMAPK1 | |
| SCHEMBL925610 | 0.93 | ALDH1A1 (0.68) | TSHRALDH1A1MEN1KMT2AMAPK1 | |
| Diethylene Glycol Monoethyl Ether SCHEMBL29037448 | 0.93 | ALDH1A1 (0.68) | TSHRALDH1A1MEN1KMT2AMAPK1 | |
| Methoxymethane SCHEMBL888183 | 0.91 | ALDH1A1 (0.58) | TSHRALDH1A1MEN1KMT2AMAPK1 | |
| Methoxymethane SCHEMBL1401430 | 0.91 | ALDH1A1 (0.58) | TSHRALDH1A1MEN1KMT2AMAPK1 | |
| Methoxymethane SCHEMBL3381489 | 0.91 | ALDH1A1 (0.58) | TSHRALDH1A1MEN1KMT2AMAPK1 | |
| SCHEMBL273033 | 0.91 | ALDH1A1 (0.62) | TSHRALDH1A1CHRM5CHRM1CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12024693-B2 | Imidazolidinethione-containing compositions for post-ash residue removal and/or for oxidative etching of a layer or mask comprising TiN | BASF SE (DE) | 2024-07-02 | — | — | US | claimed |
| CN-116286222-A | TIN pullback and cleaning compositions | 巴斯夫欧洲公司 | 2023-06-23 | — | — | CN | claimed |
| US-20210189298-A1 | IMIDAZOLIDINETHIONE-CONTAINING COMPOSITIONS FOR POST-ASH RESIDUE REMOVAL AND/OR FOR OXIDATIVE ETCHING OF A LAYER OR MASK COMPRISING TiN | BASF SE (DE) | 2021-06-24 | — | — | US | claimed |
| EP-3776083-A1 | IMIDAZOLIDINETHIONE-CONTAINING COMPOSITIONS FOR POST-ASH RESIDUE REMOVAL AND/OR FOR OXIDATIVE ETCHING OF A LAYER OR MASK COMPRISING TIN | BASF SE (DE) | 2021-02-17 | — | — | EP | claimed |
| US-10879076-B2 | Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/silicon stack during manufacture of a semiconductor device | VERSUM MATERIALS US, LLC (US) | 2020-12-29 | — | — | US | claimed |
| EP-3143117-B1 | TIN PULL-BACK AND CLEANING COMPOSITION | BASF SE (DE) | 2019-09-04 | — | — | EP | claimed |
| US-10233413-B2 | Cleaning formulations | VERSUM MATERIALS US, LLC (US) | 2019-03-19 | — | — | US | claimed |
| US-10170296-B2 | TiN pull-back and cleaning composition | BASF SE (DE) | 2019-01-01 | — | — | US | claimed |
| US-10141181-B2 | — | — | 2018-11-27 | — | — | US | claimed |
| US-20170081622-A1 | Cleaning Formulations | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-03-23 | — | — | US | claimed |
| US-20060293208-A1 | Composition for removal of residue comprising cationic salts and methods using same | VERSUM MATERIALS US, LLC | 2006-12-28 | — | — | US | claimed |
| EP-1736534-A1 | Composition for removal of residue comprising cationic salts and methods using same | Air Products and Chemicals, Inc. (US) | 2006-12-27 | — | — | EP | claimed |
| CN-1776532-A | Composition for removal of residual material from substrate and method using the composition | AIR PROD & CHEM (US) | 2006-05-24 | — | — | CN | claimed |
| EP-1619557-A1 | Composition for removing photoresist and/or etching residue from a substrate and use thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-01-25 | — | — | EP | claimed |
| US-20060014656-A1 | Composition for stripping and cleaning and use thereof | VERSUM MATERIALS US, LLC | 2006-01-19 | — | — | US | claimed |
| US-20060003910-A1 | Composition and method comprising same for removing residue from a substrate | AIR PRODUCTS AND CHEMICALS, INC. | 2006-01-05 | — | — | US | claimed |
| EP-1612858-A2 | Composition for stripping and cleaning and use thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-01-04 | — | — | EP | claimed |
| CN-1715389-A | Composition for cleaning and cleansing and use thereof | AIR PROD & CHEM (US) | 2006-01-04 | — | — | CN | claimed |
| EP-1610185-A2 | Composition and method using same for removing residue from a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-12-28 | — | — | EP | claimed |
| US-20050119143-A1 | Compositions for the removal of organic and inorganic residues | VERSUM MATERIALS US, LLC | 2005-06-02 | — | — | US | claimed |