SCHEMBL14543738

SCHEMBL14543738

O=C(OCCC1CCCCC1)c1ccc(S(=O)(=O)O)c([N+](=O)[O-])c1

nearest known ligand 0.57

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
THRB P10828 16/20 0.57
MAPT P10636 3/20 0.53
PPARG P37231 2/20 0.53
KMT2A Q03164 2/20 0.53
LMNA P02545 2/20 0.53
MEN1 O00255 1/20 0.53
POLB P06746 1/20 0.53
HTT P42858 1/20 0.53
L3MBTL1 Q9Y468 1/20 0.53
PAX8 Q06710 1/20 0.52
VDR P11473 2/20 0.52
VCAM1 P19320 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5460685 0.85 THRB (0.46) THRBMAPTPPARGKMT2ALMNA
SCHEMBL5461904 0.84 THRB (0.45) THRBMAPTPPARGKMT2ALMNA
SCHEMBL14543606 0.84 THRB (0.43) THRBMAPTPPARGKMT2ALMNA
SCHEMBL14883167 0.83 LMNA (0.52) THRBMAPTPPARGKMT2ALMNA
SCHEMBL14543737 0.83 KMT2A (0.44) THRBKMT2ALMNAPOLBHTT
SCHEMBL14543736 0.82 HTR7 (0.43) THRBMAPTPPARGKMT2ALMNA
SCHEMBL5461899 0.80 THRB (0.45) THRBMAPTPPARGKMT2ALMNA
SCHEMBL5454047 0.79 KMT2A (0.47) THRBMAPTPPARGKMT2ALMNA
SCHEMBL10087750 0.79 ESR1 (0.46) THRBMAPTPPARGKMT2ALMNA
SCHEMBL6391684 0.79 ALDH1A1 (0.44) THRBKMT2ALMNAMEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20070088131-A1 Sulfonate and resist composition TOISHI KOUJI 2007-04-19 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed
US-7175963-B2 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-13 US disclosed