SCHEMBL14543741

SCHEMBL14543741

Cc1cc(C(=O)OCCC2CCCCC2)cc(C)c1S(=O)(=O)O

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.39
HTR7 P34969 2/20 0.38
CHRM2 P08172 4/20 0.38
CHRM4 P08173 4/20 0.38
CHRM5 P08912 4/20 0.38
CHRM1 P11229 4/20 0.38
CHRM3 P20309 4/20 0.38
PTGS2 P35354 1/20 0.36
EPHX2 P34913 1/20 0.36
SCN9A Q15858 2/20 0.36
TDP1 Q9NUW8 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6395603 0.86 SCN9A (0.36) CHRM2CHRM4CHRM5CHRM1CHRM3
SCHEMBL14883130 0.85 ESR1 (0.43) ESR1HTR7CHRM2CHRM4CHRM5
SCHEMBL14543740 0.85 SCN9A (0.40) ESR1CHRM2CHRM4CHRM5CHRM1
SCHEMBL14543736 0.84 HTR7 (0.43) HTR7CHRM2CHRM4CHRM5CHRM1
SCHEMBL178364 0.83 CHRM2 (0.40) CHRM2CHRM4CHRM5CHRM1CHRM3
SCHEMBL16381868 0.82 CHRM2 (0.35) CHRM2CHRM4CHRM5CHRM1CHRM3
SCHEMBL107374 0.81 L3MBTL1 (0.43) ESR1HTR7CHRM2CHRM4CHRM5
SCHEMBL5460685 0.81 THRB (0.46) ESR1MEN1KMT2AL3MBTL1
SCHEMBL14883128 0.80 HTR7 (0.47) HTR7CHRM2CHRM4CHRM5CHRM1
SCHEMBL5461904 0.80 THRB (0.45) ESR1MEN1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20070088131-A1 Sulfonate and resist composition TOISHI KOUJI 2007-04-19 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed
US-7175963-B2 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-13 US disclosed