SCHEMBL546341

SCHEMBL546341

O=C(OCCCCCCCCCCCCCCCCCCCI)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 4/20 0.34
HDAC2 Q92769 4/20 0.34
TDP1 Q9NUW8 1/20 0.34
KMT2A Q03164 4/20 0.32
MEN1 O00255 3/20 0.32
HTT P42858 2/20 0.32
MAPK1 P28482 1/20 0.32
TSHR P16473 1/20 0.32
GAA P10253 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
CA12 O43570 2/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA9 Q16790 2/20 0.32
MAPT P10636 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HSD17B10 Q99714 1/20 0.32
HDAC3 O15379 2/20 0.32
HDAC4 P56524 2/20 0.32
HDAC7 Q8WUI4 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547114 1.00 HDAC1 (0.34) HDAC1HDAC2TDP1KMT2AMEN1
SCHEMBL547286 0.95 KMT2A (0.33) TDP1KMT2AMEN1HTTMAPK1
SCHEMBL547032 0.94 HSD11B1 (0.34) HDAC1HDAC2TDP1CA12CA1
SCHEMBL547299 0.94 HSD11B1 (0.34) HDAC1HDAC2TDP1CA12CA1
SCHEMBL546477 0.94 HSD11B1 (0.34) HDAC1HDAC2TDP1CA12CA1
SCHEMBL547272 0.92 ALDH1A1 (0.37) KMT2AMEN1MAPK1TSHRGAA
SCHEMBL547270 0.89 CA12 (0.35) HDAC1HDAC2TDP1KMT2AMEN1
SCHEMBL546871 0.88 TDP1 (0.37) HDAC1HDAC2TDP1KMT2AMEN1
SCHEMBL547319 0.88 HDAC1 (0.36) HDAC1HDAC2TDP1KMT2AMEN1
SCHEMBL546807 0.88 HDAC1 (0.36) HDAC1HDAC2TDP1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed