SCHEMBL547272

SCHEMBL547272

CC(C)(C)c1ccc(S(OS(=O)(=O)C(F)(F)C(=O)OCCCCCCCCI)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.37
NPC1 O15118 1/20 0.37
RECQL P46063 1/20 0.37
RAB9A P51151 1/20 0.37
HSD11B1 P28845 4/20 0.37
MAPK1 P28482 2/20 0.34
MAPT P10636 1/20 0.34
KEAP1 Q14145 1/20 0.34
NFE2L2 Q16236 1/20 0.34
POLB P06746 3/20 0.33
HSD17B3 P37058 1/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
EEF2K O00418 1/20 0.32
TSHR P16473 1/20 0.32
GAA P10253 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
NR1I2 O75469 1/20 0.32
CHRM2 P08172 2/20 0.32
CHRM1 P11229 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546306 0.92 HSD11B1 (0.37) ALDH1A1NPC1RAB9AHSD11B1MAPK1
SCHEMBL546341 0.92 HDAC1 (0.34) MAPK1MAPTPOLBMEN1KMT2A
SCHEMBL547114 0.92 HDAC1 (0.34) MAPK1MAPTPOLBMEN1KMT2A
SCHEMBL546477 0.89 HSD11B1 (0.34) ALDH1A1HSD11B1KEAP1NFE2L2
SCHEMBL547032 0.89 HSD11B1 (0.34) ALDH1A1HSD11B1KEAP1NFE2L2
SCHEMBL547299 0.89 HSD11B1 (0.34) ALDH1A1HSD11B1KEAP1NFE2L2
SCHEMBL547286 0.87 KMT2A (0.33) ALDH1A1HSD11B1MAPK1MAPTPOLB
SCHEMBL546641 0.85 LMNA (0.34) ALDH1A1NPC1RECQLRAB9AMAPT
SCHEMBL546510 0.85 MEN1 (0.35) ALDH1A1RECQLMAPTMEN1KMT2A
SCHEMBL547270 0.81 CA12 (0.35) MAPK1MAPTPOLBMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed