SCHEMBL547032

SCHEMBL547032

O=C(OCCCCCCCCI)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccc(F)cc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.34
FKBP1A P62942 1/20 0.34
EGFR P00533 1/20 0.32
ERBB2 P04626 1/20 0.32
CA12 O43570 2/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA9 Q16790 2/20 0.32
ALDH1A1 P00352 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
PKM P14618 1/20 0.31
NOD2 Q9HC29 1/20 0.31
NOD1 Q9Y239 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
MMP1 P03956 1/20 0.31
MMP2 P08253 1/20 0.31
MMP3 P08254 1/20 0.31
MMP9 P14780 1/20 0.31
MMP12 P39900 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547299 1.00 HSD11B1 (0.34) HSD11B1FKBP1AEGFRERBB2CA12
SCHEMBL546477 1.00 HSD11B1 (0.34) HSD11B1FKBP1AEGFRERBB2CA12
SCHEMBL546341 0.94 HDAC1 (0.34) CA12CA1CA2CA9HDAC1
SCHEMBL547114 0.94 HDAC1 (0.34) CA12CA1CA2CA9HDAC1
SCHEMBL547274 0.90 HSD11B1 (0.34) HSD11B1FKBP1AEGFRERBB2CA12
SCHEMBL547286 0.90 KMT2A (0.33) HSD11B1ALDH1A1TDP1
SCHEMBL546351 0.89 HSD11B1 (0.36) HSD11B1FKBP1AEGFRERBB2CA12
SCHEMBL546755 0.89 HSD11B1 (0.36) HSD11B1FKBP1AEGFRERBB2CA12
SCHEMBL546522 0.89 CA12 (0.34) HSD11B1FKBP1AEGFRERBB2CA12
SCHEMBL547331 0.89 CA12 (0.34) HSD11B1FKBP1AEGFRERBB2CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed