SCHEMBL546394

SCHEMBL546394

Cc1ccc(S(OS(=O)(=O)C(F)(F)C(=O)OCCCCCCCCCCBr)(c2ccc(C)cc2)c2ccc(C)cc2)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.35
MAPT P10636 2/20 0.35
TDP1 Q9NUW8 1/20 0.34
KMT2A Q03164 3/20 0.34
GAA P10253 1/20 0.34
ALDH1A1 P00352 4/20 0.33
MEN1 O00255 1/20 0.33
GSK3B P49841 1/20 0.33
LMNA P02545 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
BCHE P06276 1/20 0.32
ACHE P22303 1/20 0.32
CA2 P00918 3/20 0.31
G6PD P11413 1/20 0.31
PLA2G2C Q5R387 1/20 0.31
PTPN1 P18031 1/20 0.31
CA12 O43570 2/20 0.31
CA1 P00915 2/20 0.31
CA9 Q16790 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546312 0.96 RECQL (0.36) NPSR1MAPTTDP1KMT2AGAA
SCHEMBL546712 0.96 RECQL (0.36) NPSR1MAPTTDP1KMT2AGAA
SCHEMBL546741 0.96 KMT2A (0.38) NPSR1MAPTTDP1KMT2AGAA
SCHEMBL546513 0.89 PTPN1 (0.34) KMT2AALDH1A1MEN1LMNACA2
SCHEMBL546562 0.89 PTPN1 (0.34) KMT2AALDH1A1MEN1LMNACA2
SCHEMBL546641 0.89 LMNA (0.34) NPSR1MAPTKMT2AALDH1A1MEN1
SCHEMBL546302 0.88 TDP1 (0.37) NPSR1MAPTTDP1KMT2AGAA
SCHEMBL2183099 0.88 TDP1 (0.37) NPSR1MAPTTDP1KMT2AGAA
SCHEMBL546827 0.88 TDP1 (0.37) NPSR1MAPTTDP1KMT2AGAA
SCHEMBL547444 0.88 TDP1 (0.37) NPSR1MAPTTDP1KMT2AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed