SCHEMBL546741

SCHEMBL546741

Cc1ccc(S(OS(=O)(=O)C(F)(F)C(=O)OCCCCCCBr)(c2ccc(C)cc2)c2ccc(F)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.38
PAX8 Q06710 1/20 0.38
FKBP1A P62942 1/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
GAA P10253 1/20 0.36
BCHE P06276 1/20 0.35
ACHE P22303 1/20 0.35
EGFR P00533 1/20 0.35
ERBB2 P04626 1/20 0.35
TAS2R14 Q9NYV8 1/20 0.35
ALDH1A1 P00352 3/20 0.34
MEN1 O00255 4/20 0.33
MAPT P10636 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
TP53 P04637 1/20 0.33
POLB P06746 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
TSHR P16473 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546394 0.96 NPSR1 (0.35) KMT2AL3MBTL1GAABCHEACHE
SCHEMBL546562 0.94 PTPN1 (0.34) KMT2AALDH1A1MEN1
SCHEMBL546513 0.94 PTPN1 (0.34) KMT2AALDH1A1MEN1
SCHEMBL546712 0.92 RECQL (0.36) KMT2AFKBP1AGAAALDH1A1MEN1
SCHEMBL546312 0.92 RECQL (0.36) KMT2AFKBP1AGAAALDH1A1MEN1
SCHEMBL547409 0.90 HSD11B1 (0.36) KMT2AFKBP1AGAAEGFRERBB2
SCHEMBL546351 0.90 HSD11B1 (0.36) KMT2AFKBP1AGAAEGFRERBB2
SCHEMBL546323 0.90 HSD11B1 (0.36) KMT2AFKBP1AGAAEGFRERBB2
SCHEMBL546755 0.90 HSD11B1 (0.36) KMT2AFKBP1AGAAEGFRERBB2
SCHEMBL546858 0.90 HSD11B1 (0.36) KMT2AFKBP1AGAAEGFRERBB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed