SCHEMBL546641

SCHEMBL546641

CC(C)(C)c1ccc(S(OS(=O)(=O)C(F)(F)C(=O)OCCCCCCBr)(c2ccc(C(C)(C)C)cc2)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.34
RORA P35398 1/20 0.34
MEN1 O00255 4/20 0.33
KMT2A Q03164 4/20 0.33
EPHX2 P34913 4/20 0.33
NR1H4 Q96RI1 3/20 0.33
ALDH1A1 P00352 4/20 0.33
CA1 P00915 4/20 0.33
CA2 P00918 4/20 0.33
TP53 P04637 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
NPC1 O15118 1/20 0.33
RECQL P46063 1/20 0.33
RAB9A P51151 1/20 0.33
HDAC3 O15379 3/20 0.32
HDAC8 Q9BY41 3/20 0.32
HDAC6 Q9UBN7 3/20 0.32
EEF2K O00418 1/20 0.32
MAPT P10636 2/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546510 0.89 MEN1 (0.35) LMNARORAMEN1KMT2AEPHX2
SCHEMBL546394 0.89 NPSR1 (0.35) LMNAMEN1KMT2AALDH1A1CA1
SCHEMBL546562 0.87 PTPN1 (0.34) LMNAMEN1KMT2AALDH1A1CA1
SCHEMBL546513 0.87 PTPN1 (0.34) LMNAMEN1KMT2AALDH1A1CA1
SCHEMBL546331 0.86 TDP1 (0.37) MEN1KMT2ACA1CA2SMN1; SMN2
SCHEMBL547444 0.86 TDP1 (0.37) MEN1KMT2ACA1CA2SMN1; SMN2
SCHEMBL546827 0.86 TDP1 (0.37) MEN1KMT2ACA1CA2SMN1; SMN2
SCHEMBL546302 0.86 TDP1 (0.37) MEN1KMT2ACA1CA2SMN1; SMN2
SCHEMBL2183099 0.86 TDP1 (0.37) MEN1KMT2ACA1CA2SMN1; SMN2
SCHEMBL546871 0.86 TDP1 (0.37) MEN1KMT2ACA1CA2SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed