SCHEMBL546510

SCHEMBL546510

CC(C)(C)c1ccc(S(OS(=O)(=O)C(F)(F)C(=O)OCCCCCCCCCCCCCCCl)(c2ccc(C(C)(C)C)cc2)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
ALDH1A1 P00352 4/20 0.35
SMN1; SMN2 Q16637 3/20 0.35
TP53 P04637 1/20 0.35
RORA P35398 1/20 0.34
CA1 P00915 4/20 0.32
CA2 P00918 4/20 0.32
CA12 O43570 2/20 0.32
CA9 Q16790 2/20 0.32
EEF2K O00418 1/20 0.32
LMNA P02545 1/20 0.32
GPR35 Q9HC97 1/20 0.32
MCL1 Q07820 1/20 0.32
EPHX2 P34913 2/20 0.31
NR1H4 Q96RI1 2/20 0.31
ATM Q13315 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
KDM4E B2RXH2 1/20 0.31
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546641 0.89 LMNA (0.34) MEN1KMT2AALDH1A1SMN1; SMN2TP53
SCHEMBL546614 0.87 CA1 (0.34) MEN1KMT2AALDH1A1CA1CA2
SCHEMBL546831 0.87 CA1 (0.34) MEN1KMT2AALDH1A1CA1CA2
SCHEMBL546506 0.86 HDAC1 (0.36) MEN1KMT2ACA1CA2CA12
SCHEMBL547319 0.86 HDAC1 (0.36) MEN1KMT2ACA1CA2CA12
SCHEMBL546807 0.86 HDAC1 (0.36) MEN1KMT2ACA1CA2CA12
SCHEMBL546306 0.85 HSD11B1 (0.37) MEN1KMT2AALDH1A1SMN1; SMN2TP53
SCHEMBL547272 0.85 ALDH1A1 (0.37) MEN1KMT2AALDH1A1RORAEEF2K
SCHEMBL547030 0.85 TDP1 (0.35) MEN1KMT2ASMN1; SMN2CA1CA2
SCHEMBL546411 0.85 CA1 (0.35) MEN1KMT2ASMN1; SMN2CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed