Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL546846 | 0.77 | — | — | |
| SCHEMBL546623 | 0.74 | CYP17A1 (0.32) | — | |
| SCHEMBL19929344 | 0.73 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL1186733 | 0.71 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL13870787 | 0.70 | — | — | |
| SCHEMBL439938 | 0.69 | HSD11B1 (0.34) | HSD11B1 | |
| SCHEMBL25509620 | 0.69 | HSD11B1 (0.38) | HSD11B1 | |
| SCHEMBL4903157 | 0.68 | — | — | |
| SCHEMBL13679161 | 0.68 | — | — | |
| SCHEMBL13998868 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8475999-B2 | Compound and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-07-02 | — | — | US | disclosed |
| US-8232039-B2 | Polymer and resist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-31 | — | — | US | disclosed |
| US-8173352-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-08 | — | — | US | disclosed |
| US-8110336-B2 | Resin and chemically amplified resist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20110039209-A1 | COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20100151380-A1 | RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20100136481-A1 | RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-06-03 | — | — | US | disclosed |
| US-20100124719-A1 | Polymer and Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-05-20 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
| US-7470499-B2 | Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition | NEC CORPORATION (JP) | 2008-12-30 | — | — | US | disclosed |
| US-20050014095-A1 | Sulfonate and a resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-01-20 | — | — | US | disclosed |
| US-20040265732-A1 | Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation | NEC CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-6800419-B2 | FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-6710188-B2 | VINYL COPOLYMER HAVING 3-OXO-4-OXABICYCLO(3.2.1)OCTANE-2-YL GROUP | NEC CORPORATION (JP) | 2004-03-23 | — | — | US | disclosed |
| US-20030224297-A1 | Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | NEC CORPORATION | 2003-12-04 | — | — | US | disclosed |
| US-20030203307-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| US-6639084-B2 | Comprises vinyl polymer having 3-oxo-4-oxabicyclo(3.2.1) octane-2-yl group; sensitive to far-ultraviolet light; imaging; for use with semiconductor wafers; improved resistance against dry etching and adhesion to substrates | NEC CORPORATION (JP) | 2003-10-28 | — | — | US | disclosed |
| US-20030097008-A1 | Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | NEC CORPORATION | 2003-05-22 | — | — | US | disclosed |
| US-6410748-B1 | Alicycli c group-containing monomer | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6291129-B1 | LIGHT SENSITIVE ELEMENT WITH UNSATURATED POLYMERS | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-09-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030097008-A1 | Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | LIG1, OXGR1, ITGA1 | HSD11B1 2866/4885 |
| US-20030224297-A1 | Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | LIG1, LIG4, OXGR1 | HSD11B1 2731/4885 |
| US-20110039209-A1 | COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME | RCOR3, RCN1, HRH4 | HSD11B1 1229/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.