Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 2/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | FGF23 | Q9GZV9 | 1/20 | 0.31 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.31 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Indene SCHEMBL546792 | 0.89 | CYP2D6 (0.39) | CYP2C19CYP2D6CA1CA2NFE2L2 | |
| Indene SCHEMBL1972484 | 0.89 | MAPT (0.35) | CYP2C19CYP2D6MAPTCA1CA2 | |
| Indene SCHEMBL15048570 | 0.88 | RELA (0.40) | CYP2C19CYP2D6MAPTNFE2L2TRPA1 | |
| Indene SCHEMBL6053432 | 0.84 | MAPT (0.39) | CYP2C19CYP2D6MAPTCYP3A4 | |
| SCHEMBL15048547 | 0.83 | MAPT (0.42) | MAPTCA2FGF23NFE2L2TRPA1 | |
| Indene SCHEMBL6053478 | 0.81 | ELANE (0.37) | CYP2C19CYP2D6MAPT | |
| Indene SCHEMBL2770682 | 0.81 | CYP2D6 (0.30) | CYP2C19CYP2D6 | |
| Indene SCHEMBL3141069 | 0.81 | CYP2D6 (0.39) | CYP2C19CYP2D6CA1CA2NFE2L2 | |
| Indene SCHEMBL8048473 | 0.80 | ALDH1A1 (0.39) | CYP2C19CYP2D6MAPTCA1CA2 | |
| Indene SCHEMBL6053387 | 0.80 | ELANE (0.37) | CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8470509-B2 | Negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |