SCHEMBL547280

SCHEMBL547280

CCC(CCl)CCCCOC(=O)C(C(F)(F)F)(C(F)(F)F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.35
MEN1 O00255 3/20 0.35
HTT P42858 2/20 0.35
TSHR P16473 1/20 0.35
MAPT P10636 2/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
HSD17B10 Q99714 1/20 0.35
MAPK1 P28482 2/20 0.33
PRSS1 P07477 1/20 0.33
PRSS2 P07478 1/20 0.33
PRSS3 P35030 1/20 0.33
ALDH1A1 P00352 3/20 0.32
POLB P06746 3/20 0.32
ATM Q13315 1/20 0.32
CYP3A4 P08684 2/20 0.32
CA2 P00918 1/20 0.32
GAA P10253 2/20 0.31
NPSR1 Q6W5P4 2/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547279 0.80 KMT2A (0.35) KMT2AMEN1HTTTSHRMAPT
SCHEMBL547384 0.79 MAPK1 (0.32) KMT2AMEN1HTTTSHRMAPT
SCHEMBL547248 0.79 TDP1 (0.35) KMT2AMEN1HTTTSHRMAPT
SCHEMBL546818 0.78 KMT2A (0.33) KMT2AMEN1HTTTSHRMAPT
SCHEMBL547030 0.73 TDP1 (0.35) KMT2AMEN1HTTTSHRMAPT
SCHEMBL547319 0.72 HDAC1 (0.36) KMT2AMEN1HTTTSHRMAPK1
SCHEMBL546807 0.72 HDAC1 (0.36) KMT2AMEN1HTTTSHRMAPK1
SCHEMBL546506 0.72 HDAC1 (0.36) KMT2AMEN1HTTTSHRMAPK1
SCHEMBL547041 0.72
SCHEMBL546411 0.69 CA1 (0.35) KMT2AMEN1HTTTSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed