SCHEMBL546818

SCHEMBL546818

O=C(CCCOC(=O)C(C(F)(F)F)(C(F)(F)F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1)OCCCl

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.33
TDP1 Q9NUW8 2/20 0.32
MAPK1 P28482 2/20 0.31
HTT P42858 2/20 0.31
MEN1 O00255 1/20 0.31
TSHR P16473 1/20 0.31
L3MBTL1 Q9Y468 2/20 0.31
GAA P10253 1/20 0.31
PDK2 Q15119 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
HSD17B10 Q99714 2/20 0.31
MAPT P10636 1/20 0.31
S1PR4 O95977 1/20 0.31
LMNA P02545 1/20 0.31
TP53 P04637 1/20 0.31
HPGD P15428 1/20 0.31
S1PR1 P21453 1/20 0.31
STAT3 P40763 1/20 0.31
STAT1 P42224 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547384 0.87 MAPK1 (0.32) KMT2ATDP1MAPK1HTTMEN1
SCHEMBL547248 0.82 TDP1 (0.35) KMT2ATDP1MAPK1HTTMEN1
SCHEMBL546817 0.78 L3MBTL1 (0.32) KMT2ATDP1HTTMEN1TSHR
SCHEMBL547280 0.78 KMT2A (0.35) KMT2AMAPK1HTTMEN1TSHR
SCHEMBL547030 0.76 TDP1 (0.35) KMT2ATDP1MAPK1HTTMEN1
SCHEMBL547319 0.75 HDAC1 (0.36) KMT2ATDP1MAPK1HTTMEN1
SCHEMBL954202 0.75 HPGD (0.35) KMT2ATDP1MAPK1MEN1L3MBTL1
SCHEMBL546807 0.75 HDAC1 (0.36) KMT2ATDP1MAPK1HTTMEN1
SCHEMBL546506 0.75 HDAC1 (0.36) KMT2ATDP1MAPK1HTTMEN1
SCHEMBL547134 0.73 KMT2A (0.34) KMT2AMAPK1HTTMEN1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed