SCHEMBL547384

SCHEMBL547384

O=C(CCl)CCCOC(=O)C(C(F)(F)F)(C(F)(F)F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.33

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 2/20 0.32
KMT2A Q03164 2/20 0.32
HTT P42858 2/20 0.32
TSHR P16473 2/20 0.32
MEN1 O00255 1/20 0.32
MAPT P10636 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HSD17B10 Q99714 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
POLB P06746 2/20 0.31
GAA P10253 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546818 0.87 KMT2A (0.33) MAPK1KMT2AHTTTSHRMEN1
SCHEMBL547248 0.82 TDP1 (0.35) MAPK1KMT2AHTTTSHRMEN1
SCHEMBL547280 0.79 KMT2A (0.35) MAPK1KMT2AHTTTSHRMEN1
SCHEMBL547383 0.77 MEN1 (0.32) KMT2AHTTTSHRMEN1TDP1
SCHEMBL547030 0.75 TDP1 (0.35) MAPK1KMT2AHTTTSHRMEN1
SCHEMBL546807 0.74 HDAC1 (0.36) MAPK1KMT2AHTTTSHRMEN1
SCHEMBL546506 0.74 HDAC1 (0.36) MAPK1KMT2AHTTTSHRMEN1
SCHEMBL547319 0.74 HDAC1 (0.36) MAPK1KMT2AHTTTSHRMEN1
SCHEMBL547286 0.72 KMT2A (0.33) MAPK1KMT2AHTTTSHRMEN1
SCHEMBL546389 0.71 HSD11B1 (0.34) KMT2AMEN1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed