SCHEMBL548045

SCHEMBL548045

Cc1c(C=O)cc(C=O)cc1C=O

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ERN1 O75460 2/20 0.42
CYP2A6 P11509 1/20 0.42
ALDH1A1 P00352 7/20 0.39
TSHR P16473 3/20 0.39
SRC P12931 1/20 0.38
PRKDC P78527 1/20 0.37
TDP1 Q9NUW8 2/20 0.36
KDM4E B2RXH2 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.35
GRIA1 P42261 1/20 0.35
GRIA2 P42262 1/20 0.35
GRIA3 P42263 1/20 0.35
GRIA4 P48058 1/20 0.35
ALDH1A3 P47895 1/20 0.35
LMNA P02545 3/20 0.35
MEN1 O00255 1/20 0.35
THRB P10828 1/20 0.35
BLM P54132 1/20 0.35
KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17525662 0.84 SRC (0.36) ERN1CYP2A6ALDH1A1TSHRSRC
SCHEMBL548165 0.79 POLB (0.41) ERN1ALDH1A1SRCTDP1KDM4E
SCHEMBL7811222 0.76 ALDH1A3 (0.42) CYP2A6ALDH1A1TSHRSRCPRKDC
SCHEMBL28123711 0.76 ERN1 (0.52) ERN1ALDH1A1TSHR
SCHEMBL814444 0.74 SRC (0.48) CYP2A6ALDH1A1TSHRSRCALDH1A3
SCHEMBL5646596 0.74 ERN1 (0.56) ERN1SRC
SCHEMBL1488401 0.72 ERN1 (0.61) ERN1KDM4E
SCHEMBL28387342 0.72 TDP1 (0.35) ERN1CYP2A6ALDH1A1TSHRTDP1
SCHEMBL6516051 0.72 TDP1 (0.35) ERN1CYP2A6ALDH1A1TSHRTDP1
SCHEMBL12584035 0.72 PRKDC (0.42) ERN1ALDH1A1TSHRPRKDCTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 208 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2808736-B1 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2018-07-18 EP claimed
EP-2808736-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-12-03 EP claimed
EP-2662727-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-11-13 EP claimed
EP-2080750-B1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2020-07-29 EP disclosed
EP-1890992-B1 AN ENRICHMENT PROCESS USING COMPOUNDS USEFUL IN A POLYESTER PROCESS GRUPO PETROTEMEX SA DE CV (MX) 2019-10-23 EP disclosed
EP-1888498-B1 A PROCESS TO PRODUCE AN ENRICHMENT FEED GRUPO PETROTEMEX SA DE CV (MX) 2019-06-26 EP disclosed
EP-1888497-B1 A PROCESS TO PRODUCE AN ENRICHED COMPOSITION THROUGH THE USE OF A CATALYST REMOVAL ZONE AND AN ENRICHMENT ZONE GRUPO PETROTEMEX SA DE CV (MX) 2019-04-17 EP disclosed
EP-2066612-B1 A PROCESS TO PRODUCE AN ENRICHMENT FEED GRUPO PETROTEMEX SA DE CV (MX) 2018-08-01 EP disclosed
US-10029973-B2 Optimized liquid-phase oxidation GROPO PETROTEMEX, S.A. DE C.V. (MX) 2018-07-24 US disclosed
EP-2808736-B1 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2018-07-18 EP disclosed
US-20180072648-A1 OPTIMIZED LIQUID-PHASE OXIDATION GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2018-03-15 US disclosed
US-20060047155-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047151-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047149-A1 Optimized liquid-phase oxidation GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047157-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047161-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047154-A1 Optimized liquid-phase oxidation GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047142-A1 Optimized liquid-phase oxidation GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047143-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047163-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed