Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | THRB | P10828 | 1/20 | 0.50 |
| ▸ | BLM | P54132 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.41 |
| ▸ | TRIM33 | Q9UPN9 | 1/20 | 0.41 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | SRC | P12931 | 2/20 | 0.35 |
| ▸ | ERN1 | O75460 | 1/20 | 0.34 |
| ▸ | HTR2C | P28335 | 2/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547607 | 0.98 | LMNA (0.48) | LMNAKMT2AMEN1THRBBLM | |
| SCHEMBL31415807 | 0.98 | LMNA (0.48) | LMNAKMT2AMEN1THRBBLM | |
| SCHEMBL197356 | 0.96 | MEN1 (0.46) | LMNAKMT2AMEN1THRBBLM | |
| SCHEMBL21647623 | 0.96 | MEN1 (0.46) | LMNAKMT2AMEN1THRBBLM | |
| SCHEMBL22284134 | 0.96 | MEN1 (0.46) | LMNAKMT2AMEN1THRBBLM | |
| SCHEMBL11675315 | 0.96 | MEN1 (0.46) | LMNAKMT2AMEN1THRBBLM | |
| SCHEMBL14237042 | 0.96 | MEN1 (0.46) | LMNAKMT2AMEN1THRBBLM | |
| SCHEMBL14236917 | 0.96 | MEN1 (0.46) | LMNAKMT2AMEN1THRBBLM | |
| SCHEMBL548147 | 0.93 | LMNA (0.52) | LMNAKMT2AMEN1THRBBLM | |
| SCHEMBL6764461 | 0.84 | MEN1 (0.43) | LMNAKMT2AMEN1THRBBLM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112513737-B | Underlayer film forming composition | 三菱瓦斯化学株式会社 | 2024-11-15 | — | — | CN | disclosed |
| CN-116621897-B | Scopolamine derivatives, preparation method and medical application thereof | 中国药科大学 | 2024-07-09 | — | — | CN | disclosed |
| CN-112218844-B | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-111655662-B | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2023-09-26 | — | — | CN | disclosed |
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-05 | — | — | US | disclosed |
| CN-116621897-A | Scopolamine derivatives, preparation method and medical application thereof | 中国药科大学 | 2023-08-22 | — | — | CN | disclosed |
| CN-116282078-A | Salt recovery solution and method of using the same | 阿克福特斯技术有限公司 | 2023-06-23 | — | — | CN | disclosed |
| CN-111225875-B | Salt recovery solution and method of using salt recovery solution | 阿克福特斯技术有限公司 | 2023-04-11 | — | — | CN | disclosed |
| US-20220144738-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND METHOD FOR PURIFYING RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-05-12 | — | — | US | disclosed |
| CN-113891760-A | Solvent drying compositions and related methods | 阿克福特斯技术有限公司 | 2022-01-04 | — | — | CN | disclosed |
| US-20120156615-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-21 | — | — | US | disclosed |
| US-8110334-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-02-25 | — | — | US | disclosed |
| WO-2009133831-A1 | PHENYLPROPIONIC ACID DERIVATIVE AND USE THEREOF | 旭化成ファーマ株式会社 (JP) | 2009-11-05 | — | — | WO | disclosed |
| EP-2080750-A1 | RADIATION-SENSITIVE COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-6146811-A | Photoresist using dioxaspiro ring-substituted acryl derivatives | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2000-11-14 | — | — | US | disclosed |
| EP-0414180-A2 | Hydroxylated ene ketones, acetylenic grignards and hydroxylated yne ketones therefrom | MARION MERRELL DOW INC. (US) | 1991-02-27 | — | — | EP | disclosed |
| EP-0414180-A2 | Hydroxylated ene ketones, acetylenic grignards and hydroxylated yne ketones therefrom | MARION MERRELL DOW INC. (US) | 1991-02-27 | — | — | EP | disclosed |
| US-4973756-A | Hydroxylated ene ketones, acetylenic grignards and hydroxylated yne ketones therefrom | MARION LABORATORIES, INC. (US) | 1990-11-27 | — | — | US | disclosed |
| US-4973756-A | Hydroxylated ene ketones, acetylenic grignards and hydroxylated yne ketones therefrom | MARION LABORATORIES, INC. (US) | 1990-11-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | RER1, FEM1B, UNC119 | LMNA 2105/4885KMT2A 1359/4885MEN1 1546/4885 |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | C1S, C9, RAD51 | LMNA 286/4885KMT2A 645/4885MEN1 1910/4885 |
| US-20120156615-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | RAD1, CCNE1, CCNA1 | LMNA 559/4885KMT2A 3802/4885MEN1 400/4885 |
| US-20220144738-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND METHOD FOR PURIFYING RESIN | RER1, UNC119, FEM1B | LMNA 2688/4885KMT2A 1129/4885MEN1 1697/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.