SCHEMBL549009

SCHEMBL549009

O=Cc1cccc2c3ccccc3c3ccccc3c12

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.57
KMT2A Q03164 3/20 0.57
THRB P10828 2/20 0.57
MEN1 O00255 2/20 0.57
BLM P54132 1/20 0.57
TDP1 Q9NUW8 1/20 0.57
ALDH1A1 P00352 4/20 0.46
TRIM24 O15164 2/20 0.46
TRIM33 Q9UPN9 2/20 0.46
TSHR P16473 1/20 0.46
HPGD P15428 2/20 0.44
CYP1A2 P05177 1/20 0.44
HSD17B10 Q99714 1/20 0.44
CYP2A6 P11509 3/20 0.43
IMPDH2 P12268 2/20 0.43
ERN1 O75460 3/20 0.43
HTT P42858 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
PADI4 Q9UM07 1/20 0.41
PTPN1 P18031 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11154818 0.83 PADI4 (0.52) LMNAKMT2ATHRBMEN1BLM
SCHEMBL30363267 0.82 ALDH1A1 (0.54) LMNAKMT2ATHRBMEN1BLM
SCHEMBL29470186 0.82 ALDH1A1 (0.54) LMNAKMT2ATHRBMEN1BLM
SCHEMBL13347744 0.79 ERN1 (0.46) LMNAKMT2ATHRBMEN1BLM
SCHEMBL548871 0.79 ALDH1A1 (0.61) LMNAKMT2ATHRBMEN1BLM
SCHEMBL4245330 0.78 MEN1 (0.61) LMNAKMT2ATHRBMEN1BLM
SCHEMBL10549144 0.78 POLB (0.51) LMNAKMT2ATHRBMEN1BLM
SCHEMBL17422062 0.76 LMNA (0.52) LMNAKMT2ATHRBMEN1BLM
SCHEMBL11760945 0.76 ALDH1A1 (0.48) LMNAKMT2ATHRBMEN1BLM
SCHEMBL17422072 0.76 ALDH1A1 (0.46) LMNAKMT2ATHRBMEN1BLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2080750-B1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2020-07-29 EP disclosed
CN-106796994-B Host material for delayed phosphor, organic light emitting element, and compound 九州有机光材股份有限公司 2019-01-11 CN disclosed
US-9897913-B2 Radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-02-20 US disclosed
EP-1739485-B1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-31 EP disclosed
US-20150030980-A1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2015-01-29 US disclosed
US-8846292-B2 Radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-09-30 US disclosed
US-8236867-B2 Polymer complex having channels and method for chemically modifying inner surfaces of channels of polymer complex THE UNIVERSITY OF TOKYO (JP) 2012-08-07 US disclosed
US-20120171379-A1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-07-05 US disclosed
US-8110334-B2 Radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-02-07 US disclosed
US-7871751-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-01-18 US disclosed
US-20100324249-A1 POLYMER COMPLEX HAVING CHANNELS AND METHOD FOR CHEMICALLY MODIFYING INNER SURFACES OF CHANNELS OF POLYMER COMPLEX TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) 2010-12-23 US disclosed
US-20100047709-A1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-02-25 US disclosed
EP-2080750-A1 RADIATION-SENSITIVE COMPOSITION Mitsubishi Gas Chemical Company, Inc. (JP) 2009-07-22 EP disclosed
US-20080153031-A1 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-26 US disclosed
US-20070059632-A1 Method of manufacturing a semiconductor device MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2007-03-15 US disclosed
EP-1739485-A1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-01-03 EP disclosed
CN-1853141-A Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2006-10-25 CN disclosed
EP-1666970-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-06-07 EP disclosed
EP-0125702-B1 POLYCYCLIC AROMATIC COMPOUNDS THE WELLCOME FOUNDATION LIMITED (GB) 1987-08-12 EP disclosed
EP-0125702-A2 Polycyclic aromatic compounds THE WELLCOME FOUNDATION LIMITED (GB) 1984-11-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120171379-A1 RADIATION-SENSITIVE COMPOSITION PARG, RAD51, SRMS LMNA 469/4885KMT2A 1479/4885THRB 4164/4885
US-20100047709-A1 RADIATION-SENSITIVE COMPOSITION C1S, C9, RAD51 LMNA 286/4885KMT2A 645/4885THRB 4572/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.