SCHEMBL5520740

SCHEMBL5520740

CC(c1ccccc1)(c1ccc(O)cc1)c1ccc(O)c(O)c1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 9/20 0.74
ESR2 Q92731 6/20 0.74
ALDH1A1 P00352 2/20 0.57
CYP3A4 P08684 2/20 0.57
HPGD P15428 2/20 0.53
HSD17B10 Q99714 2/20 0.53
ALOX15 P16050 1/20 0.53
TDP1 Q9NUW8 1/20 0.53
LMNA P02545 1/20 0.43
TYR P14679 1/20 0.43
AR P10275 1/20 0.43
TSHR P16473 1/20 0.43
SLC6A2 P23975 1/20 0.43
SLC6A4 P31645 1/20 0.43
HTR6 P50406 1/20 0.43
ESRRG P62508 1/20 0.43
SLC6A3 Q01959 1/20 0.43
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
POLB P06746 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23861356 0.94 ESR1 (0.75) ESR1ESR2ALDH1A1CYP3A4HPGD
SCHEMBL12445616 0.92 HSD17B10 (0.61) ESR1ESR2ALDH1A1CYP3A4HPGD
SCHEMBL3653992 0.87 ESR1 (0.61) ESR1ESR2ALDH1A1CYP3A4HPGD
SCHEMBL27277 0.86 ESR1 (1.00) ESR1ESR2ALDH1A1CYP3A4HPGD
SCHEMBL8031149 0.86 ESR1 (1.00) ESR1ESR2ALDH1A1CYP3A4HPGD
SCHEMBL23861435 0.86 ALDH1A1 (0.70) ESR1ESR2ALDH1A1HPGDHSD17B10
SCHEMBL23059478 0.84 ESR1 (0.87) ESR1ESR2ALDH1A1CYP3A4HPGD
Methane SCHEMBL16667289 0.84 ESR1 (0.95) ESR1ESR2ALDH1A1CYP3A4HPGD
Phenol SCHEMBL29851136 0.84 ESR1 (0.95) ESR1ESR2ALDH1A1CYP3A4HPGD
SCHEMBL2442828 0.83 ESR1 (0.65) ESR1ESR2ALDH1A1CYP3A4HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260050215-A1 MATERIAL FOR FORMING SUPERFINE PATTERN, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN TREATMENT COMPOSITION AND FORMATION METHOD OF SUPERFINE PATTERN Advanced Echem Materials Company Limited (TW) 2026-02-19 US disclosed
WO-2024190311-A1 PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, DISPLAY DEVICE AND METHOD FOR PRODUCING CURED PRODUCT 東レ株式会社 2024-09-19 WO disclosed
US-11789363-B2 Positive photosensitive resin composition, cured film therefrom, and solid state image sensor comprising the same TORAY INDUSTRIES, INC. (JP) 2023-10-17 US disclosed
US-11690237-B2 Field effect-transistor, method for manufacturing same, wireless communication device using same, and product tag TORAY INDUSTRIES, INC. (JP) 2023-06-27 US disclosed
CN-110095941-B Photosensitive resin composition and method for producing semiconductor element 东丽株式会社 2023-02-17 CN disclosed
US-20210395461-A1 RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, PATTERNED CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM CENTRAL GLASS COMPANY, LIMITED (JP) 2021-12-23 US disclosed
US-20210116812-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM THEREFROM, AND SOLID STATE IMAGE SENSOR COMPRISING THE SAME TORAY INDUSTRIES, INC. (JP) 2021-04-22 US disclosed
US-20210083214-A1 FIELD EFFECT-TRANSISTOR, METHOD FOR MANUFACTURING SAME, WIRELESS COMMUNICATION DEVICE USING SAME, AND PRODUCT TAG TORAY INDUSTRIES, INC. (JP) 2021-03-18 US disclosed
CN-111919173-A Positive photosensitive resin composition, cured film thereof, and solid-state imaging device provided with cured film 东丽株式会社 2020-11-10 CN disclosed
US-10790461-B2 Field-effect transistor, method for manufacturing the same, and wireless communication device and goods tag including the same TORAY INDUSTRIES, INC. (JP) 2020-09-29 US disclosed
WO-2014119372-A1 SUBSTRATE AND TOUCH PANEL MEMBER USING SAME 東レ株式会社 (JP) 2014-08-07 WO disclosed
US-20130214379-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, AND SEMICONDUCTOR DEVICE USING THE PHOTOSENSITIVE RESIN COMPOSITION OR PHOTOSENSITIVE RESIN COMPOSITION FILM TORAY INDUSTRIES, INC. (JP) 2013-08-22 US disclosed
US-20130214379-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, AND SEMICONDUCTOR DEVICE USING THE PHOTOSENSITIVE RESIN COMPOSITION OR PHOTOSENSITIVE RESIN COMPOSITION FILM TORAY INDUSTRIES, INC. (JP) 2013-08-22 US disclosed
WO-2013099785-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING SEMICONDUCTOR ELEMENT 東レ株式会社 (JP) 2013-07-04 WO disclosed
US-20120178022-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED USING SAME, AND OPTICAL DEVICE TORAY INDUSTRIES, INC. (JP) 2012-07-12 US disclosed
US-20120178022-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED USING SAME, AND OPTICAL DEVICE TORAY INDUSTRIES, INC. (JP) 2012-07-12 US disclosed
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260050215-A1 MATERIAL FOR FORMING SUPERFINE PATTERN, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN TREATMENT COMPOSITION AND FORMATION METHOD OF SUPERFINE PATTERN SEM1, ASH2L, RAD51 ESR1 1140/4885ESR2 2362/4885ALDH1A1 287/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.