SCHEMBL23059478

SCHEMBL23059478

CC(c1ccccc1)(c1ccc(O)cc1)c1cc(C(C)(c2ccc(O)cc2)c2ccc(O)cc2)cc(C(C)(c2ccc(O)cc2)c2ccc(O)cc2)c1

nearest known ligand 0.87

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 9/20 0.87
ESR2 Q92731 9/20 0.87
CYP3A4 P08684 3/20 0.65
ALDH1A1 P00352 3/20 0.65
LMNA P02545 1/20 0.50
TYR P14679 1/20 0.50
AR P10275 1/20 0.50
HPGD P15428 1/20 0.50
TSHR P16473 1/20 0.50
SLC6A2 P23975 1/20 0.50
SLC6A4 P31645 1/20 0.50
HTR6 P50406 1/20 0.50
ESRRG P62508 1/20 0.50
SLC6A3 Q01959 1/20 0.50
HSD17B10 Q99714 1/20 0.50
MEN1 O00255 1/20 0.48
KMT2A Q03164 1/20 0.48
SHBG P04278 1/20 0.42
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8031149 0.93 ESR1 (1.00) ESR1ESR2CYP3A4ALDH1A1LMNA
SCHEMBL27277 0.93 ESR1 (1.00) ESR1ESR2CYP3A4ALDH1A1LMNA
Methane SCHEMBL16667289 0.91 ESR1 (0.95) ESR1ESR2CYP3A4ALDH1A1LMNA
Phenol SCHEMBL29851136 0.91 ESR1 (0.95) ESR1ESR2CYP3A4ALDH1A1LMNA
SCHEMBL1456440 0.91 ESR1 (0.70) ESR1ESR2CYP3A4ALDH1A1LMNA
Phenol SCHEMBL8987629 0.89 ESR1 (0.91) ESR1ESR2CYP3A4ALDH1A1LMNA
SCHEMBL30899192 0.88 ESR2 (0.74) ESR1ESR2CYP3A4ALDH1A1LMNA
Bicarbonate SCHEMBL19723102 0.87 ESR1 (0.87) ESR1ESR2CYP3A4ALDH1A1LMNA
SCHEMBL5861516 0.87 ESR1 (0.87) ESR1ESR2CYP3A4ALDH1A1LMNA
SCHEMBL22336095 0.87 ESR1 (0.87) ESR1ESR2CYP3A4ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021039407-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2021-03-04 WO disclosed