Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.45 |
| ▸ | TSHR | P16473 | 3/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 4/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | G6PD | P11413 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | CCR6 | P51684 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29387138 | 0.88 | CYP2C9 (0.41) | HKDC1CYP2C9CYP2C19TSHRCYP1A2 | |
| SCHEMBL211588 | 0.88 | CYP2C9 (0.41) | HKDC1CYP2C9CYP2C19TSHRCYP1A2 | |
| SCHEMBL5612563 | 0.87 | CYP2D6 (0.47) | CYP2C9CYP2C19TSHRCYP1A2CYP3A4 | |
| SCHEMBL27828830 | 0.85 | TRPA1 (0.44) | HKDC1CYP2C9CYP2C19TSHRCYP1A2 | |
| SCHEMBL5612635 | 0.81 | ALDH1A1 (0.45) | HKDC1CYP2C9CYP2C19CYP1A2CYP3A4 | |
| SCHEMBL28386626 | 0.79 | HKDC1 (0.46) | HKDC1CYP2C9CYP2C19TSHRCYP1A2 | |
| SCHEMBL13105485 | 0.77 | GRM2 (0.34) | HKDC1CYP2C9CYP2C19LMNANPSR1 | |
| SCHEMBL13295168 | 0.76 | CYP2D6 (0.67) | CYP2C9CYP2C19CYP1A2CYP3A4LMNA | |
| SCHEMBL11802361 | 0.75 | MAPT (0.64) | HKDC1CYP2C9CYP2C19TSHRCYP1A2 | |
| SCHEMBL1238318 | 0.75 | TSHR (0.63) | HKDC1CYP2C9CYP2C19TSHRCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101355056-A | Method for manufacturing thin film transistor substrate and photosensitive composition used in the substrate | SAMSUNG ELECTRONICS CO LTD (KR) | 2009-01-28 | — | — | CN | claimed |
| CN-111240157-B | Positive photosensitive resin composition and cured film prepared therefrom | 罗门哈斯电子材料韩国有限公司 | 2024-07-09 | — | — | CN | disclosed |
| CN-117751327-A | Positive photosensitive resin composition containing specific copolymer | 日产化学株式会社 | 2024-03-22 | — | — | CN | disclosed |
| CN-117677901-A | Positive photosensitive resin composition | 日产化学株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-117590689-A | Radiation-sensitive composition, cured film, method for producing same, display device, and curable resin composition | JSR株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-117467065-A | Resin composition and resin film | 株式会社力森诺科 | 2024-01-30 | — | — | CN | disclosed |
| CN-117126638-A | Adhesive composition, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-11-28 | — | — | CN | disclosed |
| CN-116589966-A | Adhesive composition, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116589965-A | Adhesive composition, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-115951558-B | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2023-08-04 | — | — | CN | disclosed |
| CN-1757670-A | Radial sensitive resin composite, microlens and manufacturing method therof and liquid crystal display element | JSR CORP (JP) | 2006-04-12 | — | — | CN | disclosed |
| CN-1752845-A | Ray sensitive resin composition for forming interlayer insulation film and interlayer insulation film | JSR CORP (JP) | 2006-03-29 | — | — | CN | disclosed |
| CN-1743913-A | Radiation sensitive resin composition for forming microlens | JSR CORP (JP) | 2006-03-08 | — | — | CN | disclosed |
| CN-1717629-A | Radiation-sensitive resin composition | ZEON CORP (JP) | 2006-01-04 | — | — | CN | disclosed |
| CN-1675968-A | Method for forming protrusion on electrode pad using double-layered laminate film | JSR CORP (JP) | 2005-09-28 | — | — | CN | disclosed |
| CN-1656428-A | Radiation-sensitive resin composition, patterned resin film, method for formation of the film, and use thereof | ZEON CORP (JP) | 2005-08-17 | — | — | CN | disclosed |
| CN-1646584-A | Fluorinated olefin polymer, curable resin composition, and antireflection film | JSR CORP (JP) | 2005-07-27 | — | — | CN | disclosed |
| US-20050042536-A1 | Photosensitive resin composition comprising quinonediazide sulfate ester compound | DONGJIN SEMICHEM CO. LTD. (KR) | 2005-02-24 | — | — | US | disclosed |
| CN-1568444-A | Photosnesitive resin composition comprising quinonediazide sulfate ester compound | DONGJIN SEMICHEM CO LTD (KR) | 2005-01-19 | — | — | CN | disclosed |
| CN-1509424-A | Radiation-sensitive resin composition | ������ʱ����ʽ���� | 2004-06-30 | — | — | CN | disclosed |