Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 4/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 4/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 4/20 | 0.41 |
| ▸ | HPGD | P15428 | 4/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | G6PD | P11413 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | CCR6 | P51684 | 1/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29387138 | 1.00 | CYP2C9 (0.41) | CYP2C9CYP2C19NPSR1HPGDCYP1A2 | |
| SCHEMBL13105485 | 0.89 | GRM2 (0.34) | CYP2C9CYP2C19NPSR1HPGDMAPT | |
| SCHEMBL5537841 | 0.88 | HKDC1 (0.46) | CYP2C9CYP2C19NPSR1HPGDCYP1A2 | |
| SCHEMBL27828830 | 0.83 | TRPA1 (0.44) | CYP2C9CYP2C19NPSR1HPGDCYP1A2 | |
| SCHEMBL9670426 | 0.83 | ALOX15 (0.60) | CYP2C9CYP2C19NPSR1HPGDCYP1A2 | |
| 1,2-Naphthoquinone SCHEMBL27969307 | 0.81 | PTPRC (0.46) | CYP2C9CYP2C19NPSR1HPGDCYP1A2 | |
| SCHEMBL5612635 | 0.80 | ALDH1A1 (0.45) | CYP2C9CYP2C19NPSR1HPGDCYP1A2 | |
| SCHEMBL28278737 | 0.79 | ESR2 (0.49) | HPGDMAPTALDH1A1ALOX12CACNA1C | |
| SCHEMBL3188020 | 0.77 | BACE1 (0.52) | CYP2C9CYP2C19NPSR1HPGDCYP1A2 | |
| SCHEMBL30450086 | 0.77 | CYP2D6 (0.40) | CYP2C9CYP2C19NPSR1HPGDCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 269 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101355056-B | Method for manufacturing thin film transistor substrate and photosensitive composition used in the substrate | SAMSUNG DISPLAY CO LTD | 2014-02-26 | — | — | CN | claimed |
| US-8278021-B2 | Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-02 | — | — | US | claimed |
| US-7820355-B2 | Radiation sensitive resin composition | ZEON CORPORATION (JP) | 2010-10-26 | — | — | US | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| EP-0496640-B2 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-09-19 | — | — | EP | claimed |
| EP-0706090-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-03 | — | — | EP | claimed |
| US-5798201-A | AN ALKALI SOLUBLE RESIN AND A 1,2-QUINONEDIAZIDE-5-SULFONATE COMPOUND OF POLYPHENOL; RESIN IS SUITABLE FOR USE AS A POSITIVE PHOTORESIST, EXHIBITS EXCELLENT DEVELOPABILITY, HEAT RESISTANCE AND HIGH RESOLUTION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-08-25 | — | — | US | claimed |
| EP-0496640-B1 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-06-11 | — | — | EP | claimed |
| US-5413896-A | Light sensitive element with novolak resin and quinonediazide compounds | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-05-09 | — | — | US | claimed |
| EP-0496640-A1 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-29 | — | — | EP | claimed |
| EP-4131622-B1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, METHOD FOR MANUFACTURING SAME, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG ENERGY SOLUTION LTD (KR) | 2026-01-28 | — | — | EP | disclosed |
| US-12424707-B2 | Separator for lithium secondary battery, manufacturing method therefor, and lithium secondary battery comprising same | LG ENERGY SOLUTION, LTD. (KR) | 2025-09-23 | — | — | US | disclosed |
| US-12424705-B2 | Separator for lithium secondary battery, method for manufacturing same, and lithium secondary battery comprising same | LG ENERGY SOLUTION, LTD. (KR) | 2025-09-23 | — | — | US | disclosed |
| US-20230244144-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM | ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) | 2023-08-03 | — | — | US | disclosed |
| US-5362597-A | Lenses | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-11-08 | — | — | US | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |
| EP-0520626-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-12-30 | — | — | EP | disclosed |
| EP-0496640-A1 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-29 | — | — | EP | disclosed |