Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 4/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | FDPS | P14324 | 1/20 | 0.31 |
| ▸ | METAP1 | P53582 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butane SCHEMBL2850670 | 0.82 | ALDH1A1 (0.42) | HSD17B10TDP1CA12CA1CA2 | |
| 2-Pentanol SCHEMBL143322 | 0.81 | TSHR (0.52) | HSD17B10TDP1TSHRALDH1A1 | |
| Propylene Glycol SCHEMBL28630527 | 0.80 | TDP1 (0.53) | HSD17B10TDP1CA12CA1CA2 | |
| SCHEMBL873211 | 0.80 | — | — | |
| SCHEMBL133602 | 0.79 | — | — | |
| Isobutanol SCHEMBL5541126 | 0.79 | TSHR (0.53) | HSD17B10TDP1CA12CA1CA2 | |
| 2-Pentanol SCHEMBL5539134 | 0.79 | HTT (0.50) | HSD17B10TSHR | |
| Propane SCHEMBL2849646 | 0.79 | ALDH1A1 (0.43) | HSD17B10TDP1CA12CA1CA2 | |
| SCHEMBL10885467 | 0.79 | HSD17B10 (0.43) | HSD17B10TDP1TSHRALDH1A1 | |
| Methyl Alcohol SCHEMBL20524668 | 0.79 | CA1 (0.44) | HSD17B10TDP1CA12CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070122741-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |